1.

Conference Proceedings
Conference Proceedings
1. 25 nm immersion lithography at 193 nm wavelength
Choi, S.-H. ; Park, T.-H. ; Kim, E. ; Youn, H.-J. ; Lee, D.-Y. ; Ban, Y.-C. ; Je, A.-Y. ; Kim, D.-H. ; Hong, J.-S. ; Kim, Y.-H. ; Yoo, M.-H. ; Kong, J.-T.
Pub. info.: Optical microlithography XVIII : 1-4 March, 2005, San Jose, California, USA.  pp.141-147,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5754
2.

Conference Proceedings
Conference Proceedings
2. OPC and verification accuracy enhancement using the 2D wafer image for the low kl memory devices [6154-19]
Ban, Y. C. ; Lee, D. Y. ; Hong, J. S. ; Yoo, M. H. ; Kong, J.-T.
Pub. info.: Optical Microlithography XIX.  pp.61540J-,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6154
3.

Conference Proceedings
Conference Proceedings
3. Hybrid PPC methodology using multi-step correction and implementation for the sub-100-nm node
Choi, S.-H. ; Park, J.-S. ; Park, C.-H. ; Chung, W.-Y. ; Kim, I.-S. ; Kim, D.-H. ; Kim, Y.-H. ; Yoo, M.-H. ; Kong, J.-T.
Pub. info.: Optical Microlithography XVI.  Part Two  pp.1176-1183,  2003.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5040
4.

Conference Proceedings
Conference Proceedings
4. A memory efficient large mask data handling method using repetition [6349-43]
Choi, J.-S. ; Shin, J.-P. ; Lee, J.-B. ; Yoo, M.-H. ; Kong, J.-T.
Pub. info.: Photomask Technology 2006.  pp.634918-634918,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6349
5.

Conference Proceedings
Conference Proceedings
5. Hybrid PPC methodology and implementation in the correction of etch proximity
Park, C.-H. ; Rhie, S.-U. ; Chio, S.-H. ; Kim, D.-H. ; Park, J.-S. ; Kim, Y.-H. ; Yoo, M.-H. ; Kong, J.-T.
Pub. info.: Optical Microlithography XV.  Part One  pp.369-376,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4691
6.

Conference Proceedings
Conference Proceedings
6. Simulation technique for the PR flow process using a new viscous flow model
Chung, W.-Y. ; Kim, T.-K. ; Yoon, J.-Y. ; Kim, H.-W. ; Park, Y.-K. ; Kong, J.-T.
Pub. info.: Advances in Resist Technology and Processing XXI.  pp.975-982,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5376
7.

Conference Proceedings
Conference Proceedings
7. Efficient mask data preparation for variable shaped e-beam writing system focusing on memory devices
Jang, T.H. ; Lee, J.-B. ; Shin, J.-P. ; Yoo, K.-J. ; Jung, D.-H. ; Park, Y.-H. ; Yoo, M.-H. ; Kong, J.-T.
Pub. info.: 23rd Annual BACUS Symposium on Photomask Technology.  pp.143-150,  2003.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5256
8.

Conference Proceedings
Conference Proceedings
8. Accurate gate CD control through the full-chip area using the dual model in the model-based OPC
Hong, J.-S. ; Park, C.-H. ; Kim, D.-H. ; Choi, S.-H. ; Ban, Y.-C. ; Kim, Y.-H. ; Yoo, M.-H. ; Kong, J.-T.
Pub. info.: Optical Microlithography XVII.  pp.571-580,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5377
9.

Conference Proceedings
Conference Proceedings
9. Simulation-based critical-area extraction and litho-friendly layout design for low-k1 lithography
Choi, S.-H. ; Ban, Y.-C. ; Lee, K.-H. ; Kim, D.-H. ; Hong, J.-S. ; Kim, Y.-H. ; Yoo, M.-H. ; Kong, J.-T.
Pub. info.: Optical Microlithography XVII.  pp.713-720,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5377