1.

Conference Proceedings
Conference Proceedings
1. Study of alternating phase shift mask structures for ArF lithography
Kojima, Y. ; Konishi, T. ; Sasaki, J. ; Tanaka, K. ; Komizo, T. ; Morita, M. ; Shirasaki, M. ; Ohshima, T. ; Takahashi, H. ; Chiba, K. ; Otaki, M. ; Okuda, Y.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology XI.  pp.570-577,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5446
2.

Conference Proceedings
Conference Proceedings
2. Evaluating films for high transmission attenuated phase shift masks [6283-33]
Nemoto, S. ; Komizo, T. ; Kikuchi, Y. ; Gallagher, E. ; Benz, J. ; Hibbs, M. ; Haraguchi, T.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology XIII.  pp.628322-628323,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6283
3.

Conference Proceedings
Conference Proceedings
3. Imaging behavior of high-transmission attenuating phase-shift mask films [6349-45]
Hibbs, M. ; Nemoto, S. ; Komizo, T.
Pub. info.: Photomask Technology 2006.  pp.63491A-,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6349
4.

Conference Proceedings
Conference Proceedings
4. Defect printability of alternating phase-shift mask: a critical comparison of simulation and experiment
Ozawa, K. ; Komizo, T. ; Kikuchi, K. ; Ohnuma, H. ; Kawahira, H.
Pub. info.: Optical Microlithography XV.  Part Two  pp.1009-1020,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4691
5.

Conference Proceedings
Conference Proceedings
5. Defect printability of ArF alternative phase-shift mask: a critical comparison of simulation and experiment
Ozawa, K. ; Komizo, T. ; Ohnuma, H.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology IX.  pp.630-639,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4754
6.

Conference Proceedings
Conference Proceedings
6. Phase defect printability and mask inspection capability of 65-nm technology node Alt-PSM for ArF lithography (Photomask Japan Best Paper)
Akima, S. ; Komizo, T. ; Kawakita, S. ; Kodera, Y. ; Narita, T. ; Ishikawa, K.
Pub. info.: 24th Annual BACUS Symposium on Photomask Technology.  pp.23-35,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5567
7.

Conference Proceedings
Conference Proceedings
7. Study of alternating phase-shift mask structure for 65-nm node devices
Konishi, T. ; Komizo, T. ; Takahashi, H. ; Morita, M. ; Ohshima, T. ; Chiba, K. ; Kojima, Y. ; Sasaki, J. ; Tanaka, K. ; Otaki, M. ; Okuda, Y.
Pub. info.: 23rd Annual BACUS Symposium on Photomask Technology.  pp.880-888,  2003.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5256
8.

Conference Proceedings
Conference Proceedings
8. Evaluation of quartz dry etching profile for the PSM lithography performance [5853-109]
Komizo, T. ; Nemoto, S. ; Kojima, Y. ; Ohshima, T. ; Yoshii, T. ; Konishi, T. ; Chiba, K. ; Kikuchi, Y. ; Otaki, M. ; Okuda, Y.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology XII.  pp.223-233,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5853