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Amorphous silicon technology, 1989 : symposium held April 25-28, 1989, San Diego, California, U.S.A.. pp.669-674, 1989. Pittsburgh, Pa.. Materials Research Society
Sugiyama, M. ; Nakajima, T. ; Tanaka, T. ; Itoh, H. ; Aoyama, J. ; Egashira, Y. ; Yamashita, K. ; Komiyama, H. ; Shimogaki, Y.
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Interconnect and contact metallization for ULSI : proceedings of the international symposium. pp.56-67, 1999. Pennington, N.J.. Electrochemical Society
Hu, M. ; Noda, S. ; Ogawa, F. ; Tsuji, Y. ; Okubo, T. ; Yamaguchi, F ; Komiyama, H.
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Fundamental gas-phase and surface chemistry of vapor-phase deposition II and process control, diagnostics, and modeling in semiconductor manufacturing IV : proceedings of the international symposium. pp.41-46, 2001. Pennington, N.J.. Electrochemical Society
Fujino, K. ; Egashira, Y. ; Shimogaki, Y. ; Komiyama, H.
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Proceedings of the third Symposium on Silicon Nitride and Silicon Dioxide Thin Insulating Films. pp.559-569, 1994. Pennington, NJ. Electrochemical Society
Chemical vapor deposition : proceedings of the Fourteenth International Conference and EUROCVD-11. pp.447-454, 1997. Pennington, NJ. Electrochemical Society
Sugiyama, M. ; Shimogaki, Y. ; Sudo, S. ; Nakano, Y. ; Sugawara, K. ; Tada, K. ; Komiyama, H.
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Chemical vapor deposition : proceedings of the Fourteenth International Conference and EUROCVD-11. pp.909-916, 1997. Pennington, NJ. Electrochemical Society