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17 results

Conference Proceedings

1. Growth Mechanism of SiO2 Ultra-Thin Film on Si(100) by Highly Concentrated Ozone Supplied at Low and High Pressure Conditions

Ichimura, S. ; Nakamura, K. ; Kurokawa, A. ; Itoh, H. ; Koike, K.

Pub. info.:	The physics and chemistry of SiO2 and the Si-SiO2 interface-4, 2000 : proceedings of the fourth International Symposium on the Physics and Chemistry of SiO2 and the Si-SiO2 Interface, Tronto, Canada, May 15-18, 2000. pp.67-78, 2000. Pennington, N.J.. Electrochemical Society
Title of ser.:	Electrochemical Society Proceedings Series
Ser. no.:	2000-2

Conference Proceedings

2. Size-controllable Nanostructure Array Fabrication with Self-Assembly

Hagtnoya, C. ; Ishibashi, M. ; Koike, K.

Pub. info.:	Proceedings of the Fifth International Symposium on Quantum Confinement : nanostructures. pp.335-347, 1998. Pennington, NJ. Electrochemical Society
Title of ser.:	Electrochemical Society Proceedings Series
Ser. no.:	98-19

Conference Proceedings

3. Ultrathin Silicon Dioxide Formation by Ozone on Ultraflat Si Surface

Kurokawa, A. ; Maeda, T. ; Sakamoto, K. ; Itoh, H. ; Nakamura, K. ; Koike, K. ; Moon, D. W. ; Ha, Y. H. ; Ichimura, S. ; Ando, A.

Pub. info.:	Ultrathin SiO[2] and high-K materials for USLI gate dielectrics : symposium held April 5-8, 1999, in San Francisco, California, U.S.A.. pp.21-, 1999. Warrendale, PA. MRS - Materials Research Society
Title of ser.:	Materials Research Society symposium proceedings
Ser. no.:	567

Conference Proceedings

4. Development of High Purity One ATM Ozone Source-Its Application to Ultrathin SiO2 Film Formation on Si Substrate

Koike, K. ; Inoue, G. ; Ichimura, S. ; Nakamura, K. ; Kurokawa, A. ; Nonaka, H.

Pub. info.:	Ultrathin SiO[2] and high-K materials for USLI gate dielectrics : symposium held April 5-8, 1999, in San Francisco, California, U.S.A.. pp.121-, 1999. Warrendale, PA. MRS - Materials Research Society
Title of ser.:	Materials Research Society symposium proceedings
Ser. no.:	567

Conference Proceedings

5. Control of Lamellar Orientation in γ-TiAl Based PST Crystal by Using Seed Crystals

Yamamoto, Y. ; Takeyama, M. ; Matsuo, T. ; Morishima, H. ; Koike, K.

Pub. info.:	High-Temperature ordered intermetallic alloys IX : symposium held November 27-29, 2000, Boston, Massachusetts, U.S.A.. 2001. Warrendale, Pa.. Materials Research Society
Title of ser.:	Materials Research Society symposium proceedings
Ser. no.:	646

Conference Proceedings

6. Advanced image placement performance for the current EPL masks [6151-53]

Eguchi, H. ; Sugimura, H. ; Koike, K. ; Sakaue, H. ; Arimoto, H. ; Ogawa, K. ; Susa, T. ; Kunitani, S. ; Kurosu, T. ; Yoshii, T. ; Itoh, K.

Pub. info.:	Emerging Lithographic Technologies X. pp.61511G-, 2006. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	6151

Conference Proceedings

7. Optical properties of vertically stacked self-assembled InAs quantum dots in AI0.5Ga0.5As barriers

Li, S.W. ; Miao, G.Q. ; Jiang, H. ; Yuan, G. ; Song, H. ; Jin, Y.X. ; Koike, K.

Pub. info.:	Nano-Optics and Nano-Structures. pp.91-97, 2002. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4923

Conference Proceedings

8. Self-assembled vertically stacked InAs quantum dots

Li, S. ; Koike, K.

Pub. info.:	Materials, Active Devices, and Optical Amplifiers. pp.64-68, 2004. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5280

Conference Proceedings

9. Design rule of hole-layer for electron projection lithography

Koike, K. ; Sakaue, H. ; Takenaka, H. ; Koba, F. ; Tsuchida, T. ; Yamabe, M.

Pub. info.:	Emerging Lithographic Technologies VIII. pp.495-501, 2004. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5374

10.

Conference Proceedings

10. Preliminary results of EB stepper in the application of 65-nm process

Takenaka, H. ; Koike, K. ; Tsuchida, T. ; Koba, F. ; Sakaue, H. ; Yamabe, M.

Pub. info.:	Emerging Lithographic Technologies VIII. pp.478-486, 2004. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5374

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Author: Koike, K.