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12 results

Conference Proceedings

1. Stability of CrFx films for phase-shifting mask

Kim,E. ; Hong,S. ; Jiang,Z.-T. ; Lim,S. ; Woo,S.-G. ; Koh,Y.-B. ; No,K.

Pub. info.:	Photomask and X-ray mask technology IV : 17-18 April, 1997, Kawasaki, Japan. pp.294-297, 1997. Bellingham, Washington. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3096

Conference Proceedings

2. Design and properties of new deep-UV positive photoresist

Choi,S.-J. ; Jung,S.-Y. ; Kim,C.-H. ; Park,C.-G. ; Han,W.-S. ; Koh,Y.-B. ; Lee,M.-Y.

Pub. info.:	Advances in resist technology and processing XIII : 11-13 March 1996, San Clara, California. pp.323-331, 1996. Bellingham, Wash., USA. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	2724

Conference Proceedings

3. Improved overlay measurement of CMP processed layers

Yeo,J.-H. ; Nam,J.-L. ; Oh,S.-H. ; Moon,J.-T. ; Koh,Y.-B. ; Smith,N.P. ; Smout,A.M.

Pub. info.:	Metrology, Inspection, and Process Control for Microlithography X. pp.345-354, 1996. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	2725

Conference Proceedings

4. Optical proximity correction of bit line pattern in DRAM devices

Kim,Y.-B. ; Sohn,C.-J. ; Kang,H.-Y. ; Han,W.-S. ; Koh,Y.-B.

Pub. info.:	Optical Microlithography IX. Part2 pp.670-679, 1996. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	2726

Conference Proceedings

5. Investigation on application of chromium-based materials to attenuated phase-shift masks for DUV exposure

Hong,S. ; Kim,E. ; Jiang,Z.-T. ; Bae,B.-S. ; No,K. ; Shin,W. ; Lim,S.-C. ; Woo,S.-G. ; Koh,Y.-B.

Pub. info.:	Photomask and X-Ray Mask Technology III. pp.134-137, 1996. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	2793

Conference Proceedings

6. Swing curve characteristics of halftone PSM with off-axis illumination for i-line lithography

Choi,Y.-S. ; Kang,H.-Y. ; Han,W.-S. ; Koh,Y.-B.

Pub. info.:	Optical Microlithography IX. Part2 pp.508-515, 1996. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	2726

Conference Proceedings

7. Application of alternating phase-shifting masks to sub-quarter-micrometer contact holes

Lim,S.-C. ; Kye,J.-W. ; Woo,S.-G. ; Kim,S.-G. ; Kang,H.-Y. ; Han,W.-S. ; Koh,Y.-B.

Pub. info.:	Optical Microlithography IX. Part2 pp.516-523, 1996. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	2726

Conference Proceedings

8. Application of alternating phase-shifting masks to 200-nm contact holes

Lim,S.-C. ; Woo,S.-G. ; Park,C.-G. ; Koh,Y.-B.

Pub. info.:	16th Annual BACUS Symposium on Photomask Technology and Management. pp.243-254, 1996. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	2884

Conference Proceedings

9. Fabrication of dense contact patterns using halftone phase-shifting mask with off-axis illumination

Kim,H.-J. ; Kye,J.-W. ; Lee,D.-Y. ; Woo,S.-G. ; Kang,H.-Y. ; Koh,Y.-B.

Pub. info.:	Photomask and X-Ray Mask Technology III. pp.106-114, 1996. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	2793

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Conference Proceedings

10. Side-lobe suppression in halftone PSM with optical proximity correction

Shin,I.-G. ; Lim,S.-C. ; Woo,S.-G. ; Han,W.-S. ; Koh,Y.-B.

Pub. info.:	15th Annual BACUS Symposium on Photomask Technology and Management. pp.291-299, 1995. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	2621

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Author: Koh,Y.-B.