1.

Conference Proceedings
Conference Proceedings
1. Strategies of optical proximity correction dedicated to chromeless phase lithography for 65 and 45 nm node
Winkler, T. ; Dettmann, W. ; Hennig, M. ; Koestler, W. ; Moukara, M. ; Thiele, J. ; Zeiler, K.
Pub. info.: Optical microlithography XVIII : 1-4 March, 2005, San Jose, California, USA.  pp.476-487,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5754
2.

Conference Proceedings
Conference Proceedings
2. Advanced GaInP/Ga(In)As/Ge Triple-Junction Space Solar Cells
Strobl, G. ; Hilgarth, J. ; Nell, M. ; Dietrich, R. ; Kern, R. ; Koestler, W. ; Dimroth, F. ; Schubert, U. ; Bett, A. ; LaRoche, G. ; Campesato, R. ; Flores, C. ; Timo, G. ; Signorini, C. ; Bogus, K.
Pub. info.: Proceedings of the Sixth European Space Power Conference (ESPC) : 6-10 May 2002, Porto, Portugal.  pp.539-544,  2002.  Noordwijk.  ESA Publications Division
Title of ser.: ESA SP
Ser. no.: 502
3.

Conference Proceedings
Conference Proceedings
3. Overlay considerations for 300-mm lithography
Mono, T. ; Schroeder, U.P. ; Nees, D. ; Palitzsch, K. ; Koestler, W. ; Bruch, J. ; Kramp, S. ; Veldkamp, M. ; Schuster, R.
Pub. info.: Metrology, Inspection, and Process Control for Microlithography XVII.  1  pp.121-125,  2003.  Bellingham, WA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5038