1.

Conference Proceedings
Conference Proceedings
1. Tri-Iayer resists process for fabricating sub-45-nm land S patterns by EPl [6151-80]
Koba, F. ; Matsumaro, K. ; Soda, E. ; Watanabe, T. ; Matsubara, Y. ; Arimoto, H. ; Matsumiya, T. ; Kawano, D. ; Yamashita, N. ; Fujii, Y. ; Ohmori, K. ; Sato, M. ; Kozawa, S.
Pub. info.: Emerging Lithographic Technologies X.  pp.615127-,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6151
2.

Conference Proceedings
Conference Proceedings
2. Resolution improvement of EPL stencil mask using thin membrane [6151-52]
Sugimura, H. ; Eguchi, H. ; Norimoto, M. ; Negishi, Y. ; Yonekura, I. ; Ito, K. ; Tamura, A. ; Koba, F. ; Arimoto, H
Pub. info.: Emerging Lithographic Technologies X.  pp.61511F-,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6151
3.

Conference Proceedings
Conference Proceedings
3. Design rule of hole-layer for electron projection lithography
Koike, K. ; Sakaue, H. ; Takenaka, H. ; Koba, F. ; Tsuchida, T. ; Yamabe, M.
Pub. info.: Emerging Lithographic Technologies VIII.  pp.495-501,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5374
4.

Conference Proceedings
Conference Proceedings
4. Preliminary results of EB stepper in the application of 65-nm process
Takenaka, H. ; Koike, K. ; Tsuchida, T. ; Koba, F. ; Sakaue, H. ; Yamabe, M.
Pub. info.: Emerging Lithographic Technologies VIII.  pp.478-486,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5374
5.

Conference Proceedings
Conference Proceedings
5. Performance and stability of electron projection lithography tool
Sakaue, H. ; Koike, K. ; Takenaka, H. ; Tsuchida, T. ; Koba, F. ; Yamabe, M.
Pub. info.: Emerging Lithographic Technologies VIII.  pp.487-494,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5374