1.

Conference Proceedings
Conference Proceedings
1. 193-nm resist: ultralow voltage CD-SEM performance for sub-130-nm contact hole process
Ferri, J.E. ; Vieira, M. ; Reybrouck, M. ; Mastovich, M.E. ; Bowdoin, S. ; Brandom, R. ; Knutrud, P.C.
Pub. info.: Metrology, Inspection, and Process Control for Microlithography XVII.  1  pp.608-617,  2003.  Bellingham, WA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5038
2.

Conference Proceedings
Conference Proceedings
2. Electron beam metrology of 193-nm resists at ultralow voltage
Sullivan, N.T. ; Dixson, R. ; Bunday, B.D. ; Mastovich, M.E. ; Knutrud, P.C. ; Fabre, P. ; Brandom, R.
Pub. info.: Metrology, Inspection, and Process Control for Microlithography XVII.  1  pp.483-492,  2003.  Bellingham, WA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5038
3.

Conference Proceedings
Conference Proceedings
3. Productivity enhancements in recipe creation for overlay metrology measurements
Vachellerie, V. ; Ristoiu, D. ; Deleporte, A.G. ; Poulingue, M. ; Bedin, Y. ; Arendt, R. ; Sundaram, G. ; Knutrud, P.C.
Pub. info.: Metrology, Inspection, and Process Control for Microlithography XVI.  Part One  pp.531-540,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4689
4.

Conference Proceedings
Conference Proceedings
4. Overlay metrology results on leading-edge Cu processes
Vachellerie, V. ; Ristoiu, D. ; Deleporte, A.G. ; Sassoulas, P.-O. ; Spinelli, P. ; Poulingue, M. ; Fabre, P. ; Arendt, R. ; Sundaram, G. ; Knutrud, P.C.
Pub. info.: Metrology, Inspection, and Process Control for Microlithography XVI.  Part One  pp.223-236,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4689