1.

Conference Proceedings
Conference Proceedings
1. Experiments in mask metrology using a CD AFM
Klos,M.A. ; Yedur,S.K.
Pub. info.: Metrology, inspection, and process control for microlithography XIV : 28 February - 2 March 2000, San Clara, California.  pp.350-361,  2000.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3998
2.

Conference Proceedings
Conference Proceedings
2. Foot (bottom corner) measurement of a structure with SPM
Meyyappan,A. ; Klos,M.A. ; Muckenhirn,S.
Pub. info.: Metrology, Inspection, and Process Control for Microlithography XV.  pp.733-738,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4344