1.

Conference Proceedings
Conference Proceedings
1. Development of an i-line attenuated phase shift process for dual inlay interconnect lithography
Sturtevant,J.L. ; Ho,B.C.P. ; Geiszler,V.C. ; Herrick,M.T. ; King,C.F. ; Carter,R.L. ; Roman,B.J. ; Litt,L.C. ; Smith,B. ; Strozewski,K.J.
Pub. info.: Advances in resist technology and processing XVII : 28 February - 1 March 2000, Santa Clara, USA.  Part1  pp.505-512,  2000.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3999
2.

Conference Proceedings
Conference Proceedings
2. Plasma antireflective coating optimization using enhanced reflectivity modeling
Lucas,K.D. ; Vasquez,J.A. ; Jain,A. ; Filipiak,S.M. ; Vuong,T. ; King,C.F. ; Roman,B.J.
Pub. info.: Metrology, Inspection, and Process Control for Microlithography XI.  pp.194-204,  1997.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3050