1.

Conference Proceedings
Conference Proceedings
1. Reduced Poly-Si Gate Depletion Effect by Pulsed Excimer Laser Annealing
Wong, H.Y. ; Takeuchi, H. ; King, T.-J. ; Ameen, M. ; Agarwal, A.
Pub. info.: Advanced short-time thermal processing for Si-based CMOS devices : proceedings of the international symposium.  pp.205-215,  2004.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 2004-01
2.

Conference Proceedings
Conference Proceedings
2. 22 Pulsed Excimer Laser Annealing for Meeting Near-Term Gate-Stack Process Challenges
Wong, H.Y. ; Takeshi, H. ; Padilla, A. ; King, T.-J. ; Ameen, M. ; Agarwal, A.
Pub. info.: Advanced gate stack, source/drain and channel engineering for Si-based CMOS, new materials, processes, and equipment : proceedings of the international symposium.  pp.179-187,  2005.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 2005-05
3.

Conference Proceedings
Conference Proceedings
3. Integration Issues with High k Gate Stacks*
Osburn, C.M. ; Han, S.K. ; Kim, I. ; Campbell, S.A. ; Garfunkel, E. ; Gustafson, T. ; Hauser, J. ; King, T.-J. ; Liu, Q. ; Ranade, P. ; Kingon, A. ; Kwong, D.-L. ; Lee, S.J. ; Lee, C.H. ; Lee, J. ; Onishi, K. ; Kang, C.S. ; Choi, R. ; Cho, H. ; Nich, R. ; Lucovsky, G. ; Hong, J.G. ; Ma, T.P. ; Zhu, W. ; Luo, Z. ; Maria, J.P. ; Wicaksana, D. ; Misra, V. ; Lee, J.J. ; Suh, Y.S. ; Parksons, G. ; Niu, D. ; Stemmer, S.
Pub. info.: ULSI Process Integration : proceedings of the International Symposium.  pp.375-390,  2003.  Pennington, N.J..  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 2003-6
4.

Conference Proceedings
Conference Proceedings
4. (16.4) 4:25 - 4:45 PM - In-situ Doped Poly-SiGe LPCVD Process using BCI3 for Post-CMOS Integration of MEMS Devices
Low, C. W. ; Wasilik, M L. ; Takeuchi, H. ; King, T.-J. ; Howe, R. T. (Univ. CA - Berkeley)
Pub. info.: SiGe: materials, processing, and devices : proceedings of the First international symposium.  pp.1021-1032,  2004.  Pennington, N.J..  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 2004-07
5.

Conference Proceedings
Conference Proceedings
5. Extremely scaled FinFETs and ultra-thin bod SOI CMOS Devices
Balasubrarnanian, S. ; Chang, L. ; Choi, Y.-K. ; Ha, D. ; Lee, J. ; Ranade, P. ; Xiong, S. ; Bokor, J. ; Hu, C. ; King, T.-J.
Pub. info.: Silicon-on-insulator technology and devices XI : proceedings of the international symposium.  pp.197-208,  2003.  Pennington, N.J..  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 2003-5
6.

Conference Proceedings
Conference Proceedings
6. Extremely Scaled Ultra-Thin Body and FinFET CMOS Devices*
Balasubramanion, S. ; Chang, L. ; Choi, Y.-K. ; Ha, D. ; Lee, J. ; Ranade, P. ; Xiong, S. ; Bokor, J. ; Hu, C. ; King, T.-J.
Pub. info.: ULSI Process Integration : proceedings of the International Symposium.  pp.534-545,  2003.  Pennington, N.J..  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 2003-6
7.

Conference Proceedings
Conference Proceedings
7. Poly-SiGe MEMS actuators for adaptive optics [6113-28]
Lin, B. C.-Y. ; King, T.-J. ; Muller, R. S.
Pub. info.: MEMS/MOEMS Components and Their Applications III.  pp.61130S-,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6113