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11 results

Conference Proceedings

1. Comparison study for sub-0.13-ｦﾌm lithography between ArF and KrF lithography

Kim,S.-K. ; Kim,Y.-S. ; Kim,J.-S. ; Bok,C.-K. ; Ham,Y.-M. ; Baik,K.-H.

Pub. info.:	Optical microlithography XIII : 1-3 March 2000, Santa Clara, USA. Part1 pp.435-442, 2000. Bellingham, Wash., USA. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4000

Conference Proceedings

2. Optimization for full-chip process of 130-nm technology with 248-nm DUV lithography

Ham,Y.-M. ; Kim,S.-K. ; Kim,S.-J. ; Hur,C. ; Kim,Y.-S. ; Baik,K.-H. ; Kim,B.-H. ; Ahn,D.-J.

Pub. info.:	Optical microlithography XIII : 1-3 March 2000, Santa Clara, USA. Part2 pp.1053-1061, 2000. Bellingham, Wash., USA. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4000

Conference Proceedings

3. Error-block detection technique for mobile video transmission

Park,D.-S. ; Kim,J.D. ; Kim,Y.-S.

Pub. info.:	Visual communications and image processing '97 : 12-14 February 1997, San Jose, California. Part2 pp.1231-1240, 1997. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3024

Conference Proceedings

4. Optimization of alignment key in electron-beam lithography

Kim,C.-K. ; Hur,C. ; Kim,Y.-S. ; Baik,K.-H.

Pub. info.:	Emerging lithographic technologies III : 15-17 March 1999, Santa Clara, California. Part2 pp.528-535, 1999. Bellingham, Wash.. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3676

Conference Proceedings

5. Alternating PSM defect printability at 193-nm wavelength

Lin,C.-C. ; Kim,Y.-S. ; Kimmel,K.R.

Pub. info.:	21st Annual BACUS Symposium on Photomask Technology. 4562 pp.1121-1125, 2001. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4562

Conference Proceedings

6. Optimization of ArF resist for 100-nm node: DOE and fine-tuning of basic platform

Kim,K. ; Wells,G.M. ; Kim,W.D. ; Choi,Y.-J. ; Choi,S.-J. ; Kim,Y.-S. ; Kim,D.-B.

Pub. info.:	Advances in Resist Technology and Processing XVIII. 4345 pp.168-178, 2001. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4345

Conference Proceedings

7. Novel high-performance ArF resist for sub-100-nm lithography

Lee,G. ; Koh,C.-W. ; Jung,J.-C. ; Jung,M.-H. ; Kong,K.-K. ; Kim,J.-S. ; Shin,K.-S. ; Choi,S.-J. ; Kim,Y.-S. ; Choi,Y.-J. ; Kim,D.-B.

Pub. info.:	Advances in Resist Technology and Processing XVIII. 4345 pp.150-158, 2001. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4345

Conference Proceedings

8. Standard (H.324M) compatible video decoding for mobile multimedia systems over error-prone channel

Park,D.-S. ; Kim,J.-D. ; Kim,Y.-S.

Pub. info.:	Multimedia Storage and Archiving Systems II. pp.357-364, 1997. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3229

Conference Proceedings

9. Improved lithographic performance of 193-nm photoresists based on cycloolefin/maleic anhydride copolymer by employing mixed PAGs

Choi,S.-J. ; Choi,Y.-J. ; Kim,Y.-S. ; Kim,S.-D. ; Kim,D.-B. ; Kim,J.-H. ; Koh,C.-W. ; Lee,G. ; Jung,J.-C. ; Baik,K.-H.

Pub. info.:	Advances in Resist Technology and Processing XVIII. 4345 pp.94-105, 2001. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4345

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Conference Proceedings

10. Investigation on dissolution rate effect of newly prepared polystyrene copolymer on the profiles of DUV resists

Kim,H.-J. ; Chung,Y.-S. ; Choi,Y.-J. ; Kim,Y.-S. ; Kim,D.-B.

Pub. info.:	Advances in Resist Technology and Processing XVIII. 4345 pp.528-535, 2001. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4345

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Author: Kim,Y.-S.