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17 results

Conference Proceedings

1. Single-element PV and PC detectors for medical applications

Kim,Y.-H. ; Han,M.-S. ; Jeoung,M.-S. ; Yim,N.-S. ; Hahn,S.-R.

Pub. info.:	Materials for infrared detectors : 30 July-1 August 2001, San Diego, USA. pp.142-146, 2001. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4454

Conference Proceedings

2. Practical approach to control the full-chip-level gate CD in DUV lithography

Park,C.-H. ; Kim,Y.-H. ; Lee,H.-J. ; Kong,J.-T. ; Lee,S.-H.

Pub. info.:	Optical microlithography XI : 25-27 February 1998, Santa Clara, California. pp.215-223, 1998. Bellingham, Wash., USA. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3334

Conference Proceedings

3. Evaluation of lens aberrations depending on the transmittance of DUV-attenuated PSM

Park,J.-H. ; Kim,Y.-H. ; Lim,S.-C. ; Lee,K.-H. ; Choi,S.-W. ; Yoon,H.-S. ; Sohn,J.-M.

Pub. info.:	19th Annual Symposium on Photomask Technology : 15-17 September 1999, Monterey, California. Part2 pp.937-942, 1999. Bellingham, Wash.. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3873

Conference Proceedings

4. Optical proximity correction considering mask manufacturability and its application to 0.25-ｦﾌm DRAM for enhanced device performance

Park,C.-H. ; Rhie,S.-U. ; Choi,J.-H. ; Park,J.-S. ; Seo,H.-W. ; Kim,Y.-H. ; Park,Y.-K. ; Han,W.-S. ; Lee,W.-S. ; Kong,J.-T.

Pub. info.:	Optical microlithography XIII : 1-3 March 2000, Santa Clara, USA. Part2 pp.1041-1046, 2000. Bellingham, Wash., USA. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4000

Conference Proceedings

5. Systematlc approach to correct critical patterns Induced by the lithography process at the full-chip level

Park,C.-H. ; Kim,Y.-H. ; Park,J.-S. ; Kim,K.-D. ; Yoo,M.-H. ; Kong,J.-T.

Pub. info.:	Optical microlithography XII : 17-19 March 1999, Santa Clara, California. Part2 pp.622-629, 1999. Bellingham, Wash., USA. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3679

Conference Proceedings

6. Doubly exposed patterning characteristics using two alternating phase-shift masks

Lee,S.-W. ; Shin,I.-G. ; Kim,Y.-H. ; Choi,S.-W. ; Han,W.-S. ; Yoon,H.-S. ; Sohn,J.-M.

Pub. info.:	17th European Conference on Mask Technology for Integrated Circuits and Microcomponents. pp.32-36, 2000. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4349

Technical Paper

7. Methods of Passby Noise Predictionin a Semi-Anechoic Chamber

Park,S.-H. ; Kim,Y.-H. ; Ko,B.-S.

Pub. info.:	Proceedings of the 1997 Noise and Vibration Conference. pp.947-954, 1997. Warrendale, Pa.. Society of Automotive Engineers
Title of ser.:	SAE publication
Ser. no.:	P-309

Conference Proceedings

8. Detectability and printability of programmed defect reticle for 256-Mb dram

Park,J.H. ; Cho,H.-K. ; Kim,Y.-H. ; Lee,K.-H. ; Yoon,H.-S.

Pub. info.:	Photomask and X-Ray Mask Technology III. pp.300-311, 1996. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	2793

Conference Proceedings

9. Robust and fast OPC approach for metal interconnects of 0.13um logic devices

Park,J.-S. ; Kim,D.-H. ; Park,C.-H. ; Kim,Y.-H. ; Yoo,M.-H. ; Kong,J.-T. ; Kim,H.-W. ; Yoo,S.-I.

Pub. info.:	21st Annual BACUS Symposium on Photomask Technology. 4562 pp.1104-1111, 2001. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4562

10.

Conference Proceedings

10. Comparative study on MEEF and dose latitude between attenuated PSM and Cr Binary masks

Cho,H.-J. ; Kim,Y.-H. ; Choi,S.-W. ; Han,W.-S. ; Sohn,J.-M.

Pub. info.:	Photomask and Next-Generation Lithography Mask Technology VII. pp.17-23, 2000. Bellingham, Wash.. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4066

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Author: Kim,Y.-H.