1.

Conference Proceedings
Conference Proceedings
1. Reduction of isolated-dense bias by optimization off-axis illumination for 150-nm lithography using KrF
Kim,S.-K. ; Ahn,C.-N. ; Kim,S.-M. ; Ham,Y.-M. ; Baik,K.-H.
Pub. info.: Optical microlithography XII : 17-19 March 1999, Santa Clara, California.  Part2  pp.691-696,  1999.  Bellingham, Wash., USA.  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3679
2.

Conference Proceedings
Conference Proceedings
2. Sub-120-nm technology compatibility of attenuated phase-shift mask in KrF and ArF lithography
Ham,Y.-M. ; Kim,S.-M. ; Kim,S.-J. ; Bae,S.-M. ; Kim,Y.-D. ; Baik,K.-H.
Pub. info.: 20th Annual BACUS Symposium on Photomask Technology.  pp.359-371,  2000.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4186
3.

Conference Proceedings
Conference Proceedings
3. Quantitative analysis of mask error effect on wafer CD variation in ArF lithography
Kim,S.-J. ; Koo,S.-S. ; Kim,S.-M. ; Ahn,C.-N. ; Ham,Y.-M. ; Shin,K.-S.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology VIII.  pp.101-107,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4409
4.

Conference Proceedings
Conference Proceedings
4. Application of deep-UV attenuated PSM to 0.2-ｦﾌm contact hole patterning technology
Lee,I.-H. ; Kim,S.-M. ; Ahn,C.-N. ; Biak,K.-H.
Pub. info.: 16th Annual BACUS Symposium on Photomask Technology and Management.  pp.392-402,  1996.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 2884