1.

Conference Proceedings
Conference Proceedings
1. Binary image encryption technique and decryption system using joint transform correlator
Park,S.-J. ; Seo,D.-H. ; Kim,J.-Y. ; Bae,J.-K. ; Kim,C.-S. ; Kim,S.-J.
Pub. info.: Photonic quantum technologies for aerospace applications III : 17-18 April 2001, Orlando, USA.  pp.164-171,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4386
2.

Conference Proceedings
Conference Proceedings
2. Hybrid subband image coding scheme using DWT,DPCM,and ADPCM
Oh,K.-S. ; Kim,S.-J. ; Joo,C.-B.
Pub. info.: Visual information processing VII : 13-14 April 1998, Orlando, Florida.  pp.324-330,  1998.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3387
3.

Conference Proceedings
Conference Proceedings
3. Simple constitutive model for phase transformations in ferroelectrics
Kim,S.-J.
Pub. info.: Smart structures and materials 1998 : mathematics and control in smart structures : 2-5 March 1998, San Diego, California.  pp.556-565,  1998.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3323
4.

Conference Proceedings
Conference Proceedings
4. Novel single-layer photoresist containing cycloolefins for 193 nm
Park,J.-H. ; Seo,D.-C. ; Kim,K.-D. ; Park,S.-Y. ; Kim,S.-J. ; Lee,H. ; Jung,J.-C. ; Bok,C.-K. ; Baik,K.-H.
Pub. info.: Advances in resist technology and processing XV : 23-25 February 1998, Santa Clara, California.  Part 1  pp.454-462,  1998.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3333
5.

Conference Proceedings
Conference Proceedings
5. ArF photoresist system using alicyclic polymer
Park,J.-H. ; Kim,S.-J. ; Park,S.-Y. ; Lee,H. ; Jung,J.-C. ; Bok,C.-K. ; Baik,K.-H.
Pub. info.: Advances in resist technology and processing XIV : 10-12 March 1997, Santa Clara, California.  pp.485-491,  1997.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3049
6.

Conference Proceedings
Conference Proceedings
6. Dynamic north-finding scheme based on a fiber optic gyroscope
Kim,S.-J. ; Lee,S.-S. ; Kwon,Y.-S. ; Bae,J.-C. ; Lee,S.-J
Pub. info.: Navigation and control technologies for unmanned systems II : 23 April 1997, Orlando, Florida.  pp.126-136,  1997.  Bellington, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3087
7.

Conference Proceedings
Conference Proceedings
7. Improvement of aeroelastic stability of hingeless helicopter rotor blade by passive piezoelectric damping
Kim,S.-J. ; Han,C.-H. ; Yun,C.-Y.
Pub. info.: Smart structures and materials 1999 : passive damping and isolation : 1-2 March 1999, Newport Beach, California.  pp.131-141,  1999.  Bellingham, Wash., USA.  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3672
8.

Conference Proceedings
Conference Proceedings
8. TuD3:Crystallization behavior of sputter-deposited nitrogen-doped amorphous Ge2Sb2Te5 thin films
Seo,H. ; Jeong,T.-H. ; Park,J.-W. ; Yeon,C. ; Lee,D.-C. ; Kim,S.-J. ; Lim,H.-J. ; Kim,S.-Y.
Pub. info.: ISOM/ODS '99 : joint international symposium on Optical Memory and Optical Data Strage 1999, 11-15 July 1999 Sheraton Kauai Resort, Koloa, Howaii.  pp.116-118,  1999.  Bellingham, Washington.  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3864
9.

Conference Proceedings
Conference Proceedings
9. Optimization for full-chip process of 130-nm technology with 248-nm DUV lithography
Ham,Y.-M. ; Kim,S.-K. ; Kim,S.-J. ; Hur,C. ; Kim,Y.-S. ; Baik,K.-H. ; Kim,B.-H. ; Ahn,D.-J.
Pub. info.: Optical microlithography XIII : 1-3 March 2000, Santa Clara, USA.  Part2  pp.1053-1061,  2000.  Bellingham, Wash., USA.  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4000
10.

Conference Proceedings
Conference Proceedings
10. Large bandgap shift in InGaAs(P)/Inp multiquantum well structure obtained by impurity-free vacancy diffusion using SiO2 capping and its application to photodetectors
Si,S.-K. ; Kim,S.-J. ; Lee,J.-H. ; Yeo,D.H. ; Yoon,K.H.
Pub. info.: Photodetectors : materials and devices III : 28-30 January 1998, San Jose, California.  pp.88-95,  1998.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3287