1.

Conference Proceedings
Conference Proceedings
1. TiSi-nitride-based attenuated phase-shift mask for ArF Lithography
Koo,S.-S. ; Hur,I.-B. ; Koo,Y.-M. ; Baik,K.-H. ; Choi,I.-H. ; Kim,L.-J. ; Park,K.-T. ; Shin,C.
Pub. info.: 19th Annual Symposium on Photomask Technology : 15-17 September 1999, Monterey, California.  Part2  pp.969-978,  1999.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3873
2.

Conference Proceedings
Conference Proceedings
2. Zep process optimization for submicron reticle fabrication in high-acceleration voltage writing tool
Cho,J.S. ; Kim,L.-J. ; Shin,C.
Pub. info.: 21st Annual BACUS Symposium on Photomask Technology.  4562  pp.673-681,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4562
3.

Conference Proceedings
Conference Proceedings
3. Improvement of defect density for DUV halftone PSM
Lee,K.-Y. ; Kim,L.-J. ; Yeon,K.-M. ; Lee,S.-W. ; Kim,H.-S.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology VII.  pp.388-393,  2000.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4066
4.

Conference Proceedings
Conference Proceedings
4. Potentialities of sub-100-nm optical lithography of alternating and phase-edge phase-shift mask for ArF lithography
Koo,S.-S. ; Kim,H.-B. ; Yune,H.-S. ; Hong,J.-S. ; Paek,S.-W. ; Eom,T.-S. ; Ahn,C.-N. ; Ham,Y.-M. ; Baik,K.-H. ; Lee,K.-Y. ; Kim,L.-J. ; Kim,H.-S.
Pub. info.: 20th Annual BACUS Symposium on Photomask Technology.  pp.346-358,  2000.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4186
5.

Conference Proceedings
Conference Proceedings
5. Enhanced capability improvement using OPC pattern generation in laser lithography
Lee,I.-S. ; Nam,K.-H. ; Kim,L.-J. ; Shin,C. ; Kim,H.-S.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology VIII.  pp.212-220,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4409
6.

Conference Proceedings
Conference Proceedings
6. Impact of ArF attenuated PSM using multishifter layer (TiN/Si3N4) for next-generation lithography
Nam,K.-H. ; Kim,L.-J. ; Jeong,H.-S. ; Lee,S.-W. ; Lee,I.-S. ; Shin,C. ; Kim,H.-S. ; Dieu,L. ; Paek,S.W. ; Koo,S.-S. ; Bae,S.-M. ; Ham,Y.-M. ; Shin,K.-S.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology VIII.  pp.70-80,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4409