1.

Conference Proceedings
Conference Proceedings
1. Stability of CrFx films for phase-shifting mask
Kim,E. ; Hong,S. ; Jiang,Z.-T. ; Lim,S. ; Woo,S.-G. ; Koh,Y.-B. ; No,K.
Pub. info.: Photomask and X-ray mask technology IV : 17-18 April, 1997, Kawasaki, Japan.  pp.294-297,  1997.  Bellingham, Washington.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3096
2.

Conference Proceedings
Conference Proceedings
2. Simulation study and fabrication of high-transmittance attenuated phase-shifting mask
Kim,E. ; Hong,S. ; Moon,S. ; Kim,Y. ; Yoon,H. ; No,K.
Pub. info.: 19th Annual Symposium on Photomask Technology : 15-17 September 1999, Monterey, California.  Part2  pp.928-936,  1999.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3873
3.

Conference Proceedings
Conference Proceedings
3. Advances in silica-based photonic integrated circuits
Kim,H.K. ; Lee,B.K. ; Kim,E. ; Almashary,B. ; Barrios,P.J. ; Basit,N.A. ; Mackie,D.M. ; Li,C.C.
Pub. info.: Optoelectronic interconnects VII : photonics packaging and integrations II : 24-26 January 2000, San Jose, California.  pp.332-338,  2000.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3952
4.

Conference Proceedings
Conference Proceedings
4. Integrated-optic lossless beamsplitters
Lee,B. ; Kim,E. ; Kim,H.K. ; Mackie,D.M. ; Fitzpatrick,C.M.
Pub. info.: Radio frequency photonic devices and systems : 31 July-1 august 2000, San Diego, USA.  pp.101-108,  2000.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4112
5.

Conference Proceedings
Conference Proceedings
5. GaN and ZnO epitaxial films and channel waveguides for integrated optoelectronics
Kim,H.K. ; Kim,E. ; Nahhas,A. ; Lee,B.K.
Pub. info.: Optoelectronic integrated circuits IV : 26-27 January 2000, San Jose, California.  pp.140-147,  2000.  Bellingham, Washington.  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3950
6.

Conference Proceedings
Conference Proceedings
6. Investigation on application of chromium-based materials to attenuated phase-shift masks for DUV exposure
Hong,S. ; Kim,E. ; Jiang,Z.-T. ; Bae,B.-S. ; No,K. ; Shin,W. ; Lim,S.-C. ; Woo,S.-G. ; Koh,Y.-B.
Pub. info.: Photomask and X-Ray Mask Technology III.  pp.134-137,  1996.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 2793
7.

Conference Proceedings
Conference Proceedings
7. High transmittance attenuated phase shifting mask of chromium aluminum oxynitride
Choi,E. ; Kim,E. ; Kim,H. ; Kim,Y. ; Tian,H. ; No,K.
Pub. info.: 21st Annual BACUS Symposium on Photomask Technology.  4562  pp.1141-1150,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4562