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13 results

Conference Proceedings

1. Modeling of the comb actuator deformed by microloading effect in deep reactive ion etching

Lee,J.-Y. ; Kim,S.-H. ; Lim,H.-T. ; Kim,C.-H. ; Kim,Y.-K.

Pub. info.:	Micromachining and microfabrication process technology VII : 22-24 October 2001, San Francisco, USA. pp.250-260, 2001. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4557

Conference Proceedings

2. Vacuum delay effect of CAR in mask fabrication

Kim,C.-H. ; Jeon,C.-U. ; Han,S.-J. ; Cho,W.-I. ; Choi,S.-W. ; Han,W.-S. ; Sohn,J.-M.

Pub. info.:	Emerging lithographic technologies V : 27 February-1 March, 2001, Santa Clara, [California], USA. pp.285-293, 2001. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4343

Conference Proceedings

3. Application of e-beam chemically amplified resist to devices below 0.18-μm node

Jeon,C.-U. ; Kim,C.-H. ; Choi,S.-W. ; Han,W.-S. ; Sohn,J.-M.

Pub. info.:	17th European Conference on Mask Technology for Integrated Circuits and Microcomponents. pp.160-163, 2000. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4349

Conference Proceedings

4. One-photon persistent spectral hole burning in Sm+2-doped Mg0.5Sr0.5FCI0.5Br0.5 at room temperature

Bae,H. ; Yu,B.-Y. ; Lee,J.-I. ; Jin,J.-Z. ; Pyun,C.-H. ; Kim,C.-H. ; Seo,H.-J. ; Jang,K.-W.

Pub. info.:	Rare-earth-doped materials and devices IV : 26-27 January 2000, San Jose, California. pp.122-128, 2000. Bellingham, Washington. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3942

Conference Proceedings

5. Design and properties of new deep-UV positive photoresist

Choi,S.-J. ; Jung,S.-Y. ; Kim,C.-H. ; Park,C.-G. ; Han,W.-S. ; Koh,Y.-B. ; Lee,M.-Y.

Pub. info.:	Advances in resist technology and processing XIII : 11-13 March 1996, San Clara, California. pp.323-331, 1996. Bellingham, Wash., USA. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	2724

Conference Proceedings

6. Integration of a microlens on a micro XY-stage

Kim,C.-H. ; Kim,Y.-K.

Pub. info.:	Device and process technologies for MEMS and microelectronics : 27-29 October 1999, Royal Pines Resort, Queensland, Australia. pp.109-117, 1999. Bellingham, Wash., USA. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3892

Conference Proceedings

7. Analysis of dry etch loading effect in mask fabrication

Lee,J.-Y. ; Cho,S.-Y. ; Kim,C.-H. ; Lee,S.-W. ; Choi,S.-W. ; Han,W.-S. ; Sohn,J.-M.

Pub. info.:	21st Annual BACUS Symposium on Photomask Technology. 4562 pp.609-615, 2001. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4562

Conference Proceedings

8. Quantitative analysis of the singlet exciton-polaron interaction in pare-phenylene-type ladder polymers

List,E.J.W. ; Kim,C.-H. ; Naik,A.K. ; Leising,G. ; Graupner,W. ; Shinar,J.

Pub. info.:	Organic Light-Emitting Materials and Devices IV. pp.450-463, 2000. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4105

Conference Proceedings

9. Ecperimental study on the possibility of chemically amplified resists for mask production for device generations < 180 nm

Kim,C.-H. ; Jeon,C.-U. ; Choi,S.-W. ; Han,W.-S. ; Sohn,J.-M.

Pub. info.:	20th Annual BACUS Symposium on Photomask Technology. pp.108-113, 2000. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4186

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Conference Proceedings

10. Method for prevention of unopened contact hole in dual-damascene process

Lyu,G.-H. ; Kim,C.-H. ; Lee,S.-J. ; Yang,H.-H. ; Lee,D.-Y. ; Yoo,J.-Y. ; Lee,J.-W. ; Kim,Y.-H. ; Nam,J.-L. ; Han,W.-S.

Pub. info.:	Metrology, Inspection, and Process Control for Microlithography XV. pp.22-31, 2001. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4344

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Author: Kim,C.-H.