1.

Technical Paper
Technical Paper
1. Analysis of Transient Thermal and Conversion Characteristics of Dual-Monolith Catalytic Converter with Palladium and Palladium/ Rhodium Catalysts.
Kim, Y.-D. ; Kim, W.-S. ; Jeong, S.-J.
Pub. info.: 14th Asia Pacific Automotive Engineering Conference : SAE technical paper.  2007.  Warrendale, Penn..  Society of Automotive Engineers
Title of ser.: Society of Automotive Engineers technical paper series
Ser. no.: 2007
2.

Conference Proceedings
Conference Proceedings
2. Sub-100-nm DRAM cell patterning results and relation with lens aberration at 248-nm lithography era
You, T.-J. ; Kim, H.S. ; Kim, J.-S. ; Kim, S.-K. ; Kim, Y.-D. ; Youn, H.S. ; Kong, K.-K.
Pub. info.: Optical Microlithography XVI.  Part Three  pp.1327-1334,  2003.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5040
3.

Conference Proceedings
Conference Proceedings
3. Printing 95-nm DRAM full chip patterns in KrF lithography
Kim, S.-K. ; Kim, J.-S. ; Yoo, T.-J. ; Kong, K.-K. ; Yun, H.-S. ; Kim, Y.-D. ; Kim, H.-R. ; Kim, Y.-S. ; Kim, H.S.
Pub. info.: Optical Microlithography XVI.  Part Three  pp.1321-1326,  2003.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5040
4.

Conference Proceedings
Conference Proceedings
4. Analysis of total CD uniformity at sub-100-nm DRAM patterning by using KrF lithography
Kim, Y.-S. ; You, T.J. ; Kim, J.-S. ; Kim, S.-K. ; Kong, K.-K. ; Kim, Y.-D. ; Kim, H.S.
Pub. info.: Metrology, Inspection, and Process Control for Microlithography XVII.  2  pp.1107-1113,  2003.  Bellingham, WA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5038
5.

Conference Proceedings
Conference Proceedings
5. Preserving EAPSM phase and transmission in the clean process
Choi, S.-J. ; Yoon, S.-Y. ; Kim, Y.-D. ; Lee, H.-W. ; Kim, D.-H. ; Lee, S.-W. ; Lee, D.-H. ; Kim, J.-M. ; Choi, S.-S. ; Jeong, S.H.
Pub. info.: 22nd Annual BACUS Symposium on Photomask Technology.  Part One  pp.713-724,  2002.  Bellingham, WA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4889
6.

Conference Proceedings
Conference Proceedings
6. Aberration sensitivity control for the isolation layer in low-k1 DRAM process
Cho, B.-H. ; Yim, D. ; Park, C.-H. ; Lee, S.-H. ; Yang, H.-J. ; Choi, J.-H. ; Shin, Y.-C. ; Kim, C.-D. ; Choi, J.-S. ; Kang, K.-O. ; Kim, S.-W. ; Yu, T.-H. ; Hong, J. ; Kim, J.-C. ; Han, M.-S. ; Heo, H.-Y. ; Kim, Y.-D. ; Lee, D.-D. ; Yoon, G.-H. ; van schoot, J.B. ; Theeuwes, T. ; Min, Y.-H.
Pub. info.: Optical Microlithography XV.  Part Two  pp.831-839,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4691
7.

Conference Proceedings
Conference Proceedings
7. Etching selectivity and surface profile of attenuated phase-shifting mask using CF4/O2/He inductively coupled plasma (ICP)
Yoon, S.-Y. ; Choi, S.-J. ; Kim, Y.-D. ; Lee, D.-H. ; Cha, H.-S. ; Kim, J.-M. ; Choi, S.-S. ; Jeong, S.H.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology IX.  pp.332-340,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4754
8.

Conference Proceedings
Conference Proceedings
8. Highly anisotropic etching of phase-shift masks using ICP of CF4-SF6-CHF3 gas mixtures
Choi, S.-J. ; Cha, H.-S. ; Yoon, S.-Y. ; Kim, Y.-D. ; Lee, D.-H. ; Kim, J.-M. ; Kim, J.-S. ; Min, D.-S. ; Jang, P.-J. ; Chang, B.-S. ; Kwon, H.-J. ; Choi, B.-Y. ; Choi, S.-S. ; Jeong, S.H.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology IX.  pp.303-311,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4754
9.

Conference Proceedings
Conference Proceedings
9. Dehydration bake effects with UV/O3 treatment for 130-nm node PSM processing
Kim, Y.-D. ; Lee, D.-S. ; Park, D.-I. ; Kwon, H.-J. ; Kim, J.-M. ; Jung, S.-M. ; Choi, S.-S.
Pub. info.: 23rd Annual BACUS Symposium on Photomask Technology.  pp.392-399,  2003.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5256
10.

Conference Proceedings
Conference Proceedings
10. Decrease of chrome residue on MoSiON in embedded attenuated-PSM processing
Kim, Y.-D. ; Kim, D.-W. ; Lee, D.-S. ; Jang, P.-J. ; Kwon, H.-J. ; Cho, H.-J. ; Kim, J.-M. ; Choi, S.-S.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology XI.  pp.193-199,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5446