1.

Conference Proceedings
Conference Proceedings
1. Performance comparison of projector-backprojector pairs for iterative tomographic reconstruction
Lee, S.-J. ; Kim, S.-M.
Pub. info.: Applications of digital image processing XXVI : 5-8 August 2003, San Diego, California, USA.  pp.656-667,  2003.  Bellingham, Wash., USA.  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5203
2.

Conference Proceedings
Conference Proceedings
2. Era of double exposure in 7O nm node DRAM cell
Lim, C.-M. ; Eom, T.-S. ; Kim, S.-M. ; Bok, C. ; Ma, W.-K. ; Park, G.-D. ; Moon, S.-C. ; Kim, J.-W.
Pub. info.: Optical microlithography XVIII : 1-4 March, 2005, San Jose, California, USA.  pp.368-376,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5754
3.

Conference Proceedings
Conference Proceedings
3. AC Impedance Spectra of Activated Carbon at Charged States: Effect of Pore Size and Ion Size
Jung, Y.-H. ; Park, S.-C. ; Kim, E.-S. ; Kim, S.-M. ; Kim, Y.-H.
Pub. info.: Electrochemical capacitor and hybrid power sources : proceedings of the international symposium.  pp.309-321,  2002.  Pennington, N.J..  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 2002-7
4.

Technical Paper
Technical Paper
4. Enhancement of Film Cooling Performance at the Leading Edge of Turbine Blade.
Kim, K.-S. ; Kim, Y.J. ; Kim, S.-M.
Pub. info.: A.S.M.E. paper.  2006.  New York, NY.  American Society of Mechanical Engineers
Title of ser.: ASME Technical Paper : GT
Ser. no.: 2006
5.

Conference Proceedings
Conference Proceedings
5. Comparative study of chromeless and attenuated phase shift mask for 0.3-k1 ArF lithography of DRAM
Eom, T.-S. ; Lim, C.-M. ; Kim, S.-M. ; Kim, H.-B. ; Oh, S.-Y. ; Ma, W.-K. ; Moon, S.-C. ; Shin, K.S.
Pub. info.: Optical Microlithography XVI.  Part Three  pp.1310-1320,  2003.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5040
6.

Conference Proceedings
Conference Proceedings
6. Double-exposure strategy using OPC and simulation and the performance on wafer with sub-0.10-μm design rule in ArF lithography
Oh, S.-Y. ; Kim, W.-H. ; Yune, H.-S. ; Kim, H.-B. ; Kim, S.-M. ; Ahn, C.-N. ; Shin, K.-S.
Pub. info.: Optical Microlithography XV.  Part Two  pp.1537-1543,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4691
7.

Conference Proceedings
Conference Proceedings
7. Diffraction analysis of customized illumination technique
Lim, C.-M. ; Kim, S.-M. ; Eom, T.-S. ; Moon, S.-C. ; Shin, K.S.
Pub. info.: Optical Microlithography XVII.  pp.1297-1304,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5377