Simulation of mask CD variation for different local densities with in-house developed e-beam lithography simulator
- Author(s):
Kim, M.-Y. ( Samsung Electronics Co., Ltd. (South Korea) ) Ki, W.-T. ( Samsung Electronics Co., Ltd. (South Korea) ) Lee, S.-H. ( Samsung Advanced Institute of Technology (South Korea) ) Choi, J.-H. ( Samsung Electronics Co., Ltd. (South Korea) ) Choi, S.-W. ( Samsung Electronics Co., Ltd. (South Korea) ) Sohn, J.-M. ( Samsung Electronics Co., Ltd. (South Korea) ) - Publication title:
- 23rd Annual BACUS Symposium on Photomask Technology
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 5256
- Pub. Year:
- 2003
- Page(from):
- 50
- Page(to):
- 58
- Pages:
- 9
- Pub. info.:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819451439 [0819451436]
- Language:
- English
- Call no.:
- P63600/5256.1
- Type:
- Conference Proceedings
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