W. Lee, C. Chao, X. Jiang, J. Hwang, S. Bent
Electrochemical Society
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Jonathan G. Baker, Stacey F. Bent, A.J.M. Mackus
American Institute of Chemical Engineers
|
Axel Palmstrom, Kevin Bush, Michael McGehee, Stacey F. Bent
American Institute of Chemical Engineers
|
Jonathan G. Baker, Stacey F. Bent, A.J.M. Mackus
American Institute of Chemical Engineers
|
Axel Palmstrom, Kevin Bush, Michael McGehee, Stacey F. Bent
American Institute of Chemical Engineers
|
Sung, M. M.
Electrochemical Society
|
Axel Palmstrom, Kevin Bush, Michael McGehee, Stacey F. Bent
American Institute of Chemical Engineers
|
Dara Bobb-Semple, Fatemeh Hashemi, Yin Fan, Tobin Kaufman-Osborn, Stacey F. Bent
American Institute of Chemical Engineers
|
Paul W. Loscutoff, Stacey F. Bent
American Institute of Chemical Engineers
|
Marja N. Mullings, Jonathan R. Bakke, Carl Hägglund, Stacey F. Bent
American Institute of Chemical Engineers
|
Joseph Singh, Stacey F. Bent, Nuoya Yang
American Institute of Chemical Engineers
|
Marja N. Mullings, Jonathan R. Bakke, Carl Hägglund, Stacey F. Bent
American Institute of Chemical Engineers
|