1.

Conference Proceedings
Conference Proceedings
1. Stabilization of Low Dielectric Constant SiOF Films by Post-Deposition Annealing
Kim, H.-H. ; Lee, S.-K. ; Kim, S.-O. ; Kim, Y.-H. ; Kim, H.J. ; Sohn, Y.-S. ; Yang, H.-S. ; Kim, C.-T. ; Kim, D.H.
Pub. info.: Proceedings of the Second International Symposium on Low and High Dielectric Constant Materials : Materials Science, Processing, and Reliability Issues.  pp.126-135,  1997.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 97-8
2.

Conference Proceedings
Conference Proceedings
2. Deposition and Characterization of SiOF Films for Multi-level IMD
Kim, H.-H. ; Lee, S.-K. ; Kim, S.-O. ; Kim, Y.-H. ; Kim, H.J. ; Sohn, Y.-S. ; Yang, H.-S. ; Kim, C.-T. ; Kim, D.-H.
Pub. info.: Proceedings of the Second International Symposium on Low and High Dielectric Constant Materials : Materials Science, Processing, and Reliability Issues.  pp.148-156,  1997.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 97-8
3.

Conference Proceedings
Conference Proceedings
3. Fabrication of a 45° microreflector ended polymer waveguide using one-step UV embossing technique [6124-56]
An, S. ; Lee, H.-S. ; Lee, S.-G. ; O, B.-H. ; Kim, H.-H. ; Park, S.-G. ; Lee, E.-H.
Pub. info.: Optoelectronic Integrated Circuits VIII.  pp.61241M-,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6124
4.

Conference Proceedings
Conference Proceedings
4. Extraction of exposure parameters by using neural networks
Jeon, K.-A. ; Kim, H.-H. ; Yoo, J.-Y. ; Park, J.-T. ; Oh, H.-K.
Pub. info.: Advances in Resist Technology and Processing XX.  2  pp.1105-1114,  2003.  Bellingham, CA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5039
5.

Conference Proceedings
Conference Proceedings
5. Practical extracting method of PEB parameters by using rotating compensator spectroscopic ellipsometer
Kim, H.-H. ; Kwon, Y.-K. ; Park, S.-W. ; Bang, K.-Y. ; An, I. ; Lee, K.-S. ; Oh, H.-K.
Pub. info.: Advances in Resist Technology and Processing XX.  2  pp.1124-1131,  2003.  Bellingham, CA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5039