1.

Conference Proceedings
Conference Proceedings
1. AMORPHOUS-SILICON TFTs WITH SELF-ALIGNED POLY-SILICON SOURCE AND DRAIN
Kim, C.-D. ; Sugiura, O. ; Matsumura, M.
Pub. info.: Amorphous silicon technology, 1993 : Symposium held April 13-16, San Francisco, California, U.S.A..  pp.925-932,  1993.  Pittsburgh, Pa..  Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 297
2.

Conference Proceedings
Conference Proceedings
2. Patterning with spacer for expanding the resolution limit of current lithography tool [6156-27]
Jung. W.-Y. ; Kim, C.-D. ; Eom, J-.D. ; Cho, S.-Y. ; Jeon, S.-M. ; Kim, J.-H. ; Moon, J.-I. ; Lee, B.-S. ; Park, S.-K.
Pub. info.: Design and process integration for microelectronic manufacturing IV : 23-24 February, 2006, San Jose, California, USA.  pp.61561J-,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6156
3.

Conference Proceedings
Conference Proceedings
3. Aberration sensitivity control for the isolation layer in low-k1 DRAM process
Cho, B.-H. ; Yim, D. ; Park, C.-H. ; Lee, S.-H. ; Yang, H.-J. ; Choi, J.-H. ; Shin, Y.-C. ; Kim, C.-D. ; Choi, J.-S. ; Kang, K.-O. ; Kim, S.-W. ; Yu, T.-H. ; Hong, J. ; Kim, J.-C. ; Han, M.-S. ; Heo, H.-Y. ; Kim, Y.-D. ; Lee, D.-D. ; Yoon, G.-H. ; van schoot, J.B. ; Theeuwes, T. ; Min, Y.-H.
Pub. info.: Optical Microlithography XV.  Part Two  pp.831-839,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4691