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Impact of zeolites and other porous materials on the new technologies at the beginning of the new millennium : proceedings of the 2nd International FEZA (Federation of the European Zeolite Associations) Conference, Taormina, Italy, September 1-5, 2002 : organized by the Italian Zeolite Association under the auspices of the Federation of the European Zeolite Associations. pp.1833-1840, 2002. Amsterdam. Elsevier Science B.V.
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Pits and Pores : formation, properties, and significance for advanced materials : proceedings of the International Symposium. pp.99-108, 2006. Pennington, N.J.. Electrochemical Society
Proceedings of the International Conference on Colloid and Surface Science, Tokyo, Japan, November 5-8, 2000 : 25th Anniversary of the Division of Colloid and Surface Chemistry, the Chemical Society of Japan. pp.577-580, 2001. Amsterdam. Elsevier
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24th Annual BACUS Symposium on Photomask Technology. pp.1132-1143, 2004. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
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Proceedings of SPIE - the International Society for Optical Engineering
Itou, Y. ; Tanaka, Y. ; Suga, O. ; Sugiyama, Y. ; Hagiwara, R. ; Takahashi, H. ; Takaoka, O. ; Kozakai, T. ; Matsuda, O. ; Suzuki, K. ; Okabe, M. ; Kikuchi, S. ; Uemoto, A. ; Yasaka, A. ; Adachi, T.
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25th Annual BACUS Symposium on Photomask Technology. pp.59924Y-, 2005. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
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Proceedings of SPIE - the International Society for Optical Engineering
Itou, Y. ; Tanaka, Y. ; Yoshioka, N. ; Sugiyama, Y. ; Hagiwara, R. ; Takahashi, H. ; Takaoka, O. ; Tashiro, J. ; Suzuki, K. ; Okabe, M. ; Kikuchi, S. ; Uemoto, A. ; Yasaka, A. ; Adachi, T. ; Nishida, N. ; Ozawa, T.
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Photomask and Next-Generation Lithography Mask Technology XI. pp.301-312, 2004. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
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Proceedings of SPIE - the International Society for Optical Engineering