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Conference Proceedings

1. DYNAMIC RECOIL MIXING FOR THE PRODUCTION OF SILICON NITRIDE FILMS

Kheyrandish, H. ; Colligen, J. S. ; Hill, A. E.

Pub. info.:	Ion implantation and ion beam processing of materials : symposium held November 1983 in Boston, Massachusetts, U.S.A.. pp.513-518, 1984. New York. North-Holland
Title of ser.:	Materials Research Society symposium proceedings
Ser. no.:	27

Conference Proceedings

2. CONPOSITION AND STRUCTURE OF ZIRCONIUM NITRIDE FILMS PRODUCED BY ION ASSISTED DEPOSITION

Valizadeh, R. ; Colligon, J. S. ; Donnelly, S. E. ; Faunce, C. A. ; Park, D. ; Kheyrandish, H.

Pub. info.:	Beam-solid interactions for materials synthesis and characterization : symposium held November 28-December 2, 1994, Boston, Massachusetts, U.S.A.. pp.81-, 1995. Pittsburgh, Pa.. MRS - Materials Research Society
Title of ser.:	Materials Research Society symposium proceedings
Ser. no.:	354

Conference Proceedings

3. Ion Beam Reactive Sputter-Deposition of Silicon and Zirconium Oxides

Pringle, S. D. ; Valizadeh, R. ; Colligon, J. S. ; Faunce, C. A. ; Kheyrandish, H.

Pub. info.:	Ion-solid interactions for materials modification and processing : symposium held November 27-December 1, 1995, Boston, Massachusetts, U.S.A.. pp.563-, 1996. Pittsburgh. MRS - Materials Research Society
Title of ser.:	Materials Research Society symposium proceedings
Ser. no.:	396

Conference Proceedings

4. 59 Strain Effects on Transient Enhanced Diffusion and Deactivation of Arsenic Implanted in Silicon

Dilliway, G. D. M. ; Smith, A. J. ; Hamilton, J. J. ; Xu, L. ; McNally, P. J. ; Cooke, G. ; Kheyrandish, H. ; Cowern, N. E. B.

Pub. info.:	Advanced gate stack, source/drain and channel engineering for Si-based CMOS, new materials, processes, and equipment : proceedings of the international symposium. pp.497-504, 2005. Pennington, NJ. Electrochemical Society
Title of ser.:	Electrochemical Society Proceedings Series
Ser. no.:	2005-05