1.

Conference Proceedings
Conference Proceedings
1. Integration considerations for 130-nm device patterning using ArF lithography
Okoroanyanwu,U. ; Levinson,H.J. ; Yang,C.-Y. ; Pangrle,S.K. ; Schefske,J.A. ; Kent,E.
Pub. info.: Optical microlithography XIII : 1-3 March 2000, Santa Clara, USA.  Part1  pp.423-434,  2000.  Bellingham, Wash., USA.  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4000
2.

Conference Proceedings
Conference Proceedings
2. Issues and nonissues on a 193-nm step-and-scan system in production
Schefske,J.A. ; Kent,E. ; Okoroanyanwu,U. ; Levinson,H.J. ; Masud,C.R. ; Streefkerk,B. ; Hanzen,R. ; Brueback,J.
Pub. info.: Optical microlithography XIII : 1-3 March 2000, Santa Clara, USA.  Part1  pp.460-471,  2000.  Bellingham, Wash., USA.  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4000