1.

Conference Proceedings
Conference Proceedings
1. Manufacturability and printability of AAPSM with transparent etch stop layer [6281-54]
Cangemi, M. ; Philipsen, V. ; De Ruyter, R. ; Leunissen, L. ; Morgana, N. ; Sixt, P. ; Cangemi, M. ; Cottle, R. ; Kasprowicz, B.
Pub. info.: EMLC 2006 : 22nd European Mask and Lithography Conference : 23-26 January 2006, Dresden, Germany.  pp.62810T-,  2006.  Bellingham, Wash.,.  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6281
2.

Conference Proceedings
Conference Proceedings
2. The impact of illumination on feature fidelity for CPL mask technology
Kuijten, J. P. ; Verhappen, A. ; Conley, W. ; van de Goor, S. ; Litt, L. ; Wu, W. ; Lucas, K. ; Roman, B. ; Kasprowicz, B. ; Progler, C. ; Socha, R. ; van den Broeke, D. ; Wampler, K. ; Laidig, T. ; Hsu, S.
Pub. info.: Optical microlithography XVIII : 1-4 March, 2005, San Jose, California, USA.  pp.1557-1561,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5754
3.

Conference Proceedings
Conference Proceedings
3. Optical properties and process impacts of high transmission EAPSM [6154-40]
Ham, Y. M. ; Morgana, N. ; Sixt, P. ; Cangemin, M. ; Kasprowicz, B. ; Progler, C. ; Martin, P.
Pub. info.: Optical Microlithography XIX.  pp.615413-,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6154
4.

Conference Proceedings
Conference Proceedings
4. Image imbalance compensation in alternating phase-shift masks towards the 45-nm node through-pitch imaging [5992-65]
Van Look, L. ; Kasprowicz, B. ; Zibold, A. ; Degel, W. ; Vandenberghe, G.
Pub. info.: 25th Annual BACUS Symposium on Photomask Technology.  pp.59921S-,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5992
5.

Conference Proceedings
Conference Proceedings
5. Improved prediction of across chip linewidth variation (ACLV) with photomask aerial image CD metrology [6349-23]
Poortinga, E. ; Zibold, A. ; Conley, W. ; Litt, L. C. ; Kasprowicz, B. ; Cangemi, M.
Pub. info.: Photomask Technology 2006.  pp.63490N-,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6349
6.

Conference Proceedings
Conference Proceedings
6. Chromeless phase lithography reticle defect inspection challenges and solutions
Zurbrick, L. S. ; Vacca, A. ; Reese, B. ; Van Den Broeke, D. ; Hsu, S. ; Taylor, D. ; Kasprowicz, B.
Pub. info.: 24th Annual BACUS Symposium on Photomask Technology.  pp.54-63,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5567
7.

Conference Proceedings
Conference Proceedings
7. Comparisons of 9% versus 6% transmission attenuated phase-shift mask for the 65-nm device mode
Montgomery, P.K. ; Lucas, K.D. ; Litt, L.C. ; Conley, W. ; Fanucchi, E. ; Van Wingerden, J. ; Vandenberghe, G. ; Wiaux, V. ; Taylor, D. ; Cangemi, M.J. ; Kasprowicz, B.
Pub. info.: 23rd Annual BACUS Symposium on Photomask Technology.  pp.814-825,  2003.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5256
8.

Conference Proceedings
Conference Proceedings
8. High-resolution actinic imaging and phase metrology of 193-nm CPL reticles
Merriam, A. J. ; Jacob, J. J. ; Van Den Broeke, D. ; Hsu, S. ; Chen, J. F. ; Kasprowicz, B.
Pub. info.: 24th Annual BACUS Symposium on Photomask Technology.  pp.894-904,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5567
9.

Conference Proceedings
Conference Proceedings
9. Exploring new high speed mask aware RET verification flows [5853-97]
Martin, P. ; Progler, C. J. ; Ham, Y.-M. ; Kasprowicz, B. ; Gray, R. ; Wiley, J. N. ; Yu, Z. ; Ye, J.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology XII.  pp.114-123,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5853