1.

Conference Proceedings
Conference Proceedings
1. The interaction of mask manufacturability and alt PSM design parameters
Kasprowicz, B. S. ; van Adrichem, P. J. M.
Pub. info.: EMLC 2005 : 21st European Mask and Lithography Conference : 31 January-3 February, 2005, Dresden, Germany.  pp.63-68,  2005.  Bellingham, Wash.,.  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5835
2.

Conference Proceedings
Conference Proceedings
2. Tunable transmission phase mask options for 65/45nm node gate and contact processing
Kasprowicz, B. S. ; Conley, W. ; Ham, Y.-M. ; Cangemi, M. J. ; Morgana, N. ; Cottle, R. ; Progler, C. J. ; Wu, W. ; Litt, L. C. ; Cobb, J. ; Roman, B.
Pub. info.: Optical microlithography XVIII : 1-4 March, 2005, San Jose, California, USA.  pp.1469-1477,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5754
3.

Conference Proceedings
Conference Proceedings
3. Applications of CPL mask technology for sub-65nm gate imaging
Litt, L. C. ; Conley, W. ; Wu, W. ; Peters, R. ; Parker, C. ; Cobb, J. ; Kasprowicz, B. S. ; van den Broeke, D. ; Park, J. C. ; Karur-Shanmugam, R.
Pub. info.: Optical microlithography XVIII : 1-4 March, 2005, San Jose, California, USA.  pp.1459-1468,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5754
4.

Conference Proceedings
Conference Proceedings
4. An efficient resolution enhancement technique flow for 65nm logic poly layer [5853-96]
van Adrichem, P. J. M. ; Chacko, M. ; Kasprowicz, B. S.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology XII.  pp.109-113,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5853
5.

Conference Proceedings
Conference Proceedings
5. High transmission mask technology for 45nm node imaging [6154-38]
Conley, W. ; Morgana, N. ; Kasprowicz, B. S. ; Cangemi, M. ; Lassiter, M. ; Litt, L. C. ; Cangemi, M. ; Cottle, R. ; Wu, W. ; Cobb, J. ; Ham, Y. -M. ; Lucas, K. ; Roman, B. ; Progler, C.
Pub. info.: Optical Microlithography XIX.  pp.615411-,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6154
6.

Conference Proceedings
Conference Proceedings
6. A practical alternating PSM modeling and OPC approach to deal with 3D mask effects for the 65nm node and beyond [5992-66]
Drapeau, M. ; van Adrichem, P. J. M. ; van Look, L. ; Kasprowicz, B. S.
Pub. info.: 25th Annual BACUS Symposium on Photomask Technology.  pp.59921T-,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5992
7.

Conference Proceedings
Conference Proceedings
7. Reducing alternating phase shift mask (Alt-PSM) write-time through mask data optimization [5853-40]
Kasprowicz, B. S. ; van Adrichem, P. J. M. ; Chacko, M.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology XII.  pp.583-588,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5853