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12 results

Conference Proceedings

1. Large assist feature phase-shift mask for sub-quarter-micrometer window pattern formation

Ishida,S. ; Yasuzato,T. ; Tanabe,H. ; Kasama,K.

Pub. info.:	Photomask and X-ray mask technology IV : 17-18 April, 1997, Kawasaki, Japan. pp.333-343, 1997. Bellingham, Washington. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3096

Conference Proceedings

2. Effect of stage synchronization error of KrF scan on 0.18-ｦﾌm patterning

Uchiyama,T. ; Hashimoto,T. ; Fujimoto,M. ; Matsuura,S. ; Yamazaki,T. ; Kasama,K.

Pub. info.:	Optical microlithography XI : 25-27 February 1998, Santa Clara, California. pp.67-76, 1998. Bellingham, Wash., USA. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3334

Conference Proceedings

3. Deblocking reaction of chemically amplified ArF positive resists

Yamana,M. ; Itani,T. ; Yoshino,H. ; Hashimoto,S. ; Tanabe,H. ; Kasama,K.

Pub. info.:	Advances in resist technology and processing XV : 23-25 February 1998, Santa Clara, California. Part 1 pp.32-42, 1998. Bellingham, Wash., USA. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3333

Conference Proceedings

4. Deblocking reaction of chemically amplified positive DUV resists

Yamana,M. ; Itani,T. ; Yoshino,H. ; Hashimoto,S. ; Samoto,N. ; Kasama,K.

Pub. info.:	Advances in resist technology and processing XIV : 10-12 March 1997, Santa Clara, California. pp.269-279, 1997. Bellingham, Wash., USA. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3049

Conference Proceedings

5. Acid evaporation property in chemically amplified resists

Hashimoto,S. ; Itani,T. ; Yoshino,H. ; Yamana,M. ; Samoto,N. ; Kasama,K.

Pub. info.:	Advances in resist technology and processing XIV : 10-12 March 1997, Santa Clara, California. pp.248-255, 1997. Bellingham, Wash., USA. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3049

Conference Proceedings

6. Halation reduction for single-layer DUV resist processing

Yoshino,H. ; Itani,T. ; Hashimoto,S. ; Yamana,M. ; Samoto,N. ; Kasama,K.

Pub. info.:	Advances in resist technology and processing XIII : 11-13 March 1996, San Clara, California. pp.216-226, 1996. Bellingham, Wash., USA. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	2724

Conference Proceedings

7. DOF enhancement of isolated line patterns by newly developed assistant pattern method

Matsuura,S. ; Hashimoto,T. ; Uchiyama,T. ; Fujimoto,M. ; Kasama,K.

Pub. info.:	Optical Microlithography X. pp.245-256, 1997. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3051

Conference Proceedings

8. Optical proximity correction of alternating phase-shift masks for 0.18-ｦﾌm KrF lithography

Yasuzato,T. ; Ishida,S. ; Shioiri,S. ; Tanabe,H. ; Kasama,K.

Pub. info.:	Optical Microlithography X. pp.751-762, 1997. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3051

Conference Proceedings

9. Attenuated phase-shift masks reducing side-lobe effect in DRAM peripheral circuit region

Iwasaki,H. ; Hoshi,K. ; Tanabe,H. ; Kasama,K.

Pub. info.:	17th Annual BACUS Symposium on Photomask Technology and Management. pp.544-550, 1998. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3236

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Conference Proceedings

10. Improvement of resist pattern fidelity with partial attenuated phase-shift mask

Yasuzato,T. ; Ishida,S. ; Kasama,K.

Pub. info.:	Optical Microlithography IX. Part2 pp.496-507, 1996. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	2726

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