1.

Conference Proceedings
Conference Proceedings
1. Propagation of resist heating mask error to wafer level [6349-193]
Babin, S. V. ; Karklin, L.
Pub. info.: Photomask Technology 2006.  pp.634950-634950,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6349
2.

Conference Proceedings
Conference Proceedings
2. Impact of subwavelength CD tolerance of device performance
Balasinski, A. ; Karklin, L. ; Axelrad, V.
Pub. info.: Design, process integration, and characterization for microelectronics : 6-7 March 2002, Santa Clara, USA.  pp.361-368,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4692
3.

Conference Proceedings
Conference Proceedings
3. Subwavelength lithography: an impact of photomask errors on cricuit performance
Karklin, L. ; Mazor, S. ; Joshi, D. ; Balasinski, A. ; Axelrad, V.
Pub. info.: Optical Microlithography XV.  Part One  pp.259-267,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4691
4.

Conference Proceedings
Conference Proceedings
4. Novel procedure for mask disposition electrical signatures of mask defects
Balasinski, A. ; Iandolo, W. ; Ray, O. ; Karklin, L. ; Axelrad, V.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology IX.  pp.606-613,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4754
5.

Conference Proceedings
Conference Proceedings
5. Lithographic analysis of distributed photomask defects: II. Random mask CD errors
Karklin, L.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology IX.  pp.660-665,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4754
6.

Conference Proceedings
Conference Proceedings
6. Aerial image simulations of soft and phase defects in 193-nm lithography for 100-nm node
Driessen, F.A. ; van Adrichem, P. ; Philipsen, V. ; Jonckheere, R. ; Liu, H.-Y. ; Karklin, L.
Pub. info.: Optical Microlithography XV.  Part Two  pp.1180-1189,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4691
7.

Conference Proceedings
Conference Proceedings
7. Simulation study of 193-nm phase-shifting masks: analysis of distributed aefectsof embeded attenuated phase mask (EAPSM)
Karklin, L.
Pub. info.: 18th European Conference on Mask Technology for Integrated Circuits and Microcomponents.  pp.240-243,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4764
8.

Conference Proceedings
Conference Proceedings
8. Mask manufacturability issues for subwavelength lithography
Karklin, L. ; Rachlin, K. E.
Pub. info.: Photomask and X-Ray Mask Technology VI.  pp.273-277,  1999.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3748