1.

Conference Proceedings
Conference Proceedings
1. Feasibility evaluations of alternating phase-shift mask for imaging sub-80nm feature with KrF
Kang, M.-A. ; Kim, S.-H. ; Shin, I.-K. ; Choi, S.-W. ; Sohn, J.-M.
Pub. info.: Optical Microlithography XVI.  Part Two  pp.1115-1124,  2003.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5040
2.

Conference Proceedings
Conference Proceedings
2. Optical properties of a-Si films for 157-nm lithography
Kim, S.K. ; Kim, Y.S. ; Kang, M.-A. ; Sohn, J.-M. ; No, K.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology X.  pp.127-135,  2003.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5130