Bae, T.M. ; Jin, S.H. ; Choo, J.H. ; Park, M. ; Ro, Y.M. ; Kim, H.-R. ; Kang, K.
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Internet imaging V : 19-20 January 2004, San Jose, California, USA. pp.214-223, 2003. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
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Proceedings of SPIE - the International Society for Optical Engineering
Fukada, T. ; Yoo, W.S. ; Hiraga, Y. ; Kang, K. ; Kitayama, H.
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Rapid thermal and other short-time processing technologies II : proceedings of the international symposium. pp.113-120, 2001. Pennington, NJ. Electrochemical Society
Yoo, W.S. ; Fukada, T. ; Hiraga, Y. ; Kang, K. ; Yamamoto, J.
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Rapid thermal and other short-time processing technologies II : proceedings of the international symposium. pp.401-408, 2001. Pennington, NJ. Electrochemical Society
Advanced short-time thermal processing for Si-based CMOS devices : proceedings of the international symposium. pp.3-10, 2004. Pennington, NJ. Electrochemical Society
Developments in X-ray tomography IV : 4-6 August, 2004, Denver, Colorado, USA. pp.514-521, 2004. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Advanced short-time thermal processing for Si-based CMOS devices : proceedings of the international symposium. pp.111-118, 2003. Pennington, NJ. Electrochemical Society
Yoshimoto, M. ; Nishigaki, H. ; Harima, H. ; Kang, K. ; Yoo, W. S.
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Advanced gate stack, source/drain and channel engineering for Si-based CMOS, new materials, processes, and equipment : proceedings of the international symposium. pp.50-57, 2005. Pennington, NJ. Electrochemical Society
Suzuki, T. ; Seto, M. ; Suzuki, N. ; Kang, K. ; Yoo, W. S.
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Advanced gate stack, source/drain and channel engineering for Si-based CMOS, new materials, processes, and equipment : proceedings of the international symposium. pp.68-75, 2005. Pennington, NJ. Electrochemical Society