1.

Conference Proceedings
Conference Proceedings
1. Resist cluster formation model and development simulation
Kamon,K. ; Nakazawa,K. ; Yamaguchi,A. ; Matsuzawa,N.N. ; Ohfuji,T. ; Sasago,M. ; Kanzaki,K. ; Tagawa,S.
Pub. info.: Advances in resist technology and processing XV : 23-25 February 1998, Santa Clara, California.  Part 1  pp.472-483,  1998.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3333
2.

Conference Proceedings
Conference Proceedings
2. Time-dependent simulation of acid and product distributions in chemically amplified resist
Kamon,K. ; Nakazawa,K. ; Yamaguchi,A. ; Matsuzawa,N. ; Ohfuji,T. ; Tagawa,S.
Pub. info.: Advances in resist technology and processing XIV : 10-12 March 1997, Santa Clara, California.  pp.180-188,  1997.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3049
3.

Conference Proceedings
Conference Proceedings
3. Estimation of optical proximity effect caused by mask fabrication error
Kamon,K. ; Hanawa,T. ; Moriizumi,K.
Pub. info.: Optical Microlithography X.  pp.781-789,  1997.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3051
4.

Conference Proceedings
Conference Proceedings
4. Fast and accurate optical proximity correction based on aerial image simulation
Hanawa,T. ; Kamon,K. ; Nakae,A. ; Nakao,S. ; Moriizumi,K.
Pub. info.: Optical Microlithography IX.  Part2  pp.640-650,  1996.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 2726
5.

Conference Proceedings
Conference Proceedings
5. Optical proximity effect of a next-generation superresolution technique
Kamon,K.
Pub. info.: Optical Microlithography X.  pp.66-76,  1997.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3051