Kuriyama, K. ; Suzuki, T. ; Hirumi, J. ; Yoshioka, N. ; Hojo, Y. ; Kawase, Y. ; Hara, S. ; Hoga, M. ; Watanabe, S.W. ; Inoue, M. ; Kawase, H. ; Kamimoto, T.
Pub. info.:
Photomask and Next-Generation Lithography Mask Technology X. pp.660-671, 2003. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Kawase, H. ; Kamimoto, T. ; Ogasawara, H. ; Kuriyama, K. ; Hirumi, J. ; Yoshioka, N.
Pub. info.:
Photomask and Next-Generation Lithography Mask Technology X. pp.638-647, 2003. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Suzuki, T. ; Hirumi, J. ; Yoshioka, N. ; Hojyo, Y. ; Kawase, Y. ; Hara, S. ; Kuriyama, K. ; Hoga, M. ; Watanabe, S.W. ; Kawase, H. ; Kamimoto, T. ; Kato, K.
Pub. info.:
Photomask and Next-Generation Lithography Mask Technology XI. pp.414-421, 2004. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering