1.

Conference Proceedings
Conference Proceedings
1. Defect inspection of zero E-field border on i-line 9% PSM
Chen,J.X. ; Kalk,F.D.
Pub. info.: Metrology, inspection, and process control for microlithography XII : 23-25 February 1998, San Clara, California.  pp.329-335,  1998.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3332
2.

Conference Proceedings
Conference Proceedings
2. Dry etch yield enhancement by use of after-develop inspection
Kalk,F.D. ; Brankner,K.J. ; Peters,L. ; Vacca,A. ; Pomeroy,S. ; Emery,D.
Pub. info.: 19th Annual Symposium on Photomask Technology : 15-17 September 1999, Monterey, California.  Part1  pp.108-116,  1999.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3873
3.

Conference Proceedings
Conference Proceedings
3. Improving reticle yields with after develop inspection(ADI)
Kalk,F.D. ; Brankner,K.J. ; Peters,L. ; Vacca,A. ; Pomeroy,S. ; Emery,D.
Pub. info.: 16th European Conference on Mask Technology for Integrated Circuits and Microcomponents : 15-16 November 1999, Munich, Germany.  pp.38-46,  2000.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3996
4.

Conference Proceedings
Conference Proceedings
4. Design,reticle,and wafer OPC manufacturability for the 0.18-ｦﾌm lithography generation
Lucas,K.D. ; McCallum,M. ; Falch,B.J. ; Wood,J.L. ; Kalk,F.D. ; Henderson,R.K. ; Russell,D.R.
Pub. info.: Optical microlithography XII : 17-19 March 1999, Santa Clara, California.  Part1  pp.118-129,  1999.  Bellingham, Wash., USA.  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3679
5.

Conference Proceedings
Conference Proceedings
5. Die-to-die and die-to-database capability analysis for advanced OPC inspection
Chen,J.X. ; Russell,D.R. ; Terhune,R. ; Riddick,J. ; Kalk,F.D. ; Lucas,K.D. ; Falch,B.J.
Pub. info.: 19th Annual Symposium on Photomask Technology : 15-17 September 1999, Monterey, California.  Part2  pp.626-634,  1999.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3873
6.

Conference Proceedings
Conference Proceedings
6. Chromium-based attenuated embedded phase-shift photomask blanks for use in 1X lithography
Schurz,D.L. ; Tai,E. ; Kalk,F.D.
Pub. info.: 15th Annual BACUS Symposium on Photomask Technology and Management.  pp.505-515,  1995.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 2621
7.

Conference Proceedings
Conference Proceedings
7. Detection and printability of random and programmed pinholes on Cr photomasks
Kalk,F.D. ; Vacca,A. ; Howard,C. ; Karklin,L.
Pub. info.: Photomask and X-Ray Mask Technology III.  pp.267-278,  1996.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 2793
8.

Conference Proceedings
Conference Proceedings
8. Pinhole defect detection and printability prediction
Kalk,F.D. ; Vacca,A. ; Radcliff,P.
Pub. info.: 16th Annual BACUS Symposium on Photomask Technology and Management.  pp.104-112,  1996.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 2884
9.

Conference Proceedings
Conference Proceedings
9. Photomask production integration of KLA STARlight 300 system
Kalk,F.D. ; Mentzer,D. ; Vacca,A.
Pub. info.: 15th Annual BACUS Symposium on Photomask Technology and Management.  pp.112-121,  1995.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 2621
10.

Conference Proceedings
Conference Proceedings
10. Universal inspection standard for evaluation of inspection system and algorithm sensitivity and runability
Chen,J.X. ; Howard,C.H. ; Son,K. ; Kalk,F.D. ; Lee,I.-H.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology VII.  pp.327-337,  2000.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4066