1.

Conference Proceedings
Conference Proceedings
1. Hyper-numerical aperture imaging challenges for 193 nm
Mizoguchi, H. ; Inoue, T. ; Fujimoto, J. ; Yamazaki, T. ; Suzuki, T. ; Matsunaga, T. ; Sakanishi, S. ; Kaminishi, M. ; Watanabe, Y. ; Ohta, T. ; Nakane, M. ; Moriya, M. ; Nakaike, T. ; Shinbori, M. ; Yoshino, M. ; Kawasuji, T. ; Nogawa, H. ; Ito, T. ; Umeda, H. ; Tanaka, S. ; Taniguchi, H. ; Sasaki, Y. ; Kinoshita, J. ; Abe, T. ; Tanaka, H. ; Hayashi, H. ; Miyao, K. ; Niwano, M. ; Kurosu, A. ; Yashiro, M. ; Nagano, H. ; Matsui, N. ; Mimura, T. ; Kakizaki, K. ; Goto, M.
Pub. info.: Optical microlithography XVIII : 1-4 March, 2005, San Jose, California, USA.  pp.69-79,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5754
2.

Conference Proceedings
Conference Proceedings
2. Microstructure and Magnetic Behavior of Granular CoPt Thin Film*
Hiratsuka, N. ; Akiyoshi, K. ; Kakizaki, K. ; Donnet, D.M. ; Kobayashi, K.
Pub. info.: Electrochemical technology applications in electronics : proceedings of the third international symposium.  pp.298-303,  1999.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 99-34
3.

Conference Proceedings
Conference Proceedings
3. Feasibility study of 6 kHz ArF excimer laser for 193 nm immersion lithography
Hori, T. ; Yabu, T. ; Ishihara, T. ; Watanabe, T. ; Wakabayashi, O. ; Sumitani, A. ; Kakizaki, K. ; Mizoguchi, H.
Pub. info.: Optical microlithography XVIII : 1-4 March, 2005, San Jose, California, USA.  pp.1285-1292,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5754
4.

Technical Paper
Technical Paper
4. Effects of Magnetic Field Distribution on Performance of Liquid Metal MHD Generator
Kakizaki, K. ; Maeda, T. ; Shimizu, K. ; Ishikawa, M.
Pub. info.: AIAA meeting papers on disc.  2004.  [Reston, Va.].  American Institute of Aeronautics and Astronautics
Title of ser.: AIAA Paper : AIAA Plasmadynamics and Lasers Conference
Ser. no.: 35th
5.

Conference Proceedings
Conference Proceedings
5. GT40A: durable 45-W ArF injection-lock laser light source fordryjimmersion lithography [6154-99]
Tanaka, S. ; Tsushima, H. ; Nakaike, T. ; Yamazaki, T. ; Saito, T. ; Tomaru, H. ; Kakizaki, K. ; Matsunaga, T. ; Suzuki, T. ; Wakabayashi, O. ; Nagai, S. ; Fujimoto, J. ; Inoue, T. ; Mizoguchi, H
Pub. info.: Optical Microlithography XIX.  pp.61542O-,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6154
6.

Conference Proceedings
Conference Proceedings
6. Ultra line-narrowed ArF excimer laser G42A for sub-90-nm lithography generation
Saito, T. ; Suzuki, T. ; Yoshino, M. ; Wakabayashi, O. ; Matsunaga, T. ; Fujimoto, J. ; Kakizaki, K. ; Yamazaki, T. ; Inoue, T. ; Terashima, K. ; Enami, T. ; Inoue, H. ; Sumitani, A. ; Tomaru, H. ; Mizoguchi, H.
Pub. info.: Optical Microlithography XVI.  Part Three  pp.1704-1711,  2003.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5040
7.

Conference Proceedings
Conference Proceedings
7. Beam quality of a new-type MOPO laser system for VUV laser lithography
Wakabayashi, O. ; Ariga, T. ; Kumazaki, T. ; Sasano, K. ; Watanabe, T. ; Yabu, T. ; Hori, T. ; Kakizaki, K. ; Sumitani, A. ; Mizoguchi, H.
Pub. info.: Optical Microlithography XVII.  pp.1772-1780,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5377
8.

Conference Proceedings
Conference Proceedings
8. Development of high-power ArF/F2 laser platform for VUV microlithography
Kakizaki, K. ; Fujimoto, J. ; Yamazaki, T. ; Suzuki, T. ; Matsunaga, T. ; Kawasuji, Y. ; Watanabe, Y. ; Kaminishi, M. ; Inoue, T. ; Mizoguchi, H. ; Kumazaki, T. ; Ariga, T. ; Watanabe, T. ; Yabu, T. ; Sasano, K. ; Hori, T. ; Wakabayashi, O. ; Sumitani, A.
Pub. info.: Optical Microlithography XVII.  pp.1805-1814,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5377