1.

Conference Proceedings
Conference Proceedings
1. Lithography simulation of contamination-caused defects
C.E. Novak ; K.D. Lucas ; A.J. Strojwas ; Z.-M. Ling
Pub. info.: Integrated circuit metrology, inspection, and process control IX : 20-22 February 1995, Santa Clara, California.  pp.198-209,  1995.  Bellingham, WA.  Society of Photo-optical Instrumentation Engineers
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 2439
2.

Conference Proceedings
Conference Proceedings
2. Efficient 3D phase-shifting mask lithography simulation
K.D. Lucas ; A.J. Strojwas ; H. Tanabe
Pub. info.: Optical/laser microlithography VIII : 22-24 February, 1995, Santa Clara, California.  pp.422-434,  1995.  Bellingham, WA.  Society of Photo-optical Instrumentation Engineers
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 2440