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14 results

Conference Proceedings

1. Evaluation of Physical Properties on Functionally Graded Piping Joints Made from Cu and Austenitic Stainless Steel Powder

K. Nakano ; T. Anzai ; T. Yamaguchi ; K. Nishio

Pub. info.:	Multiscale, multifunctional and functionally graded materials : selected, peer reviewed papers from the 10th International Symposium on MM & FGMs, 22nd-25th September 2008, Sendai, Japan. pp.273-278, 2010. Aedermannsdorf, Switzerland. Trans Tech Publications
Title of ser.:	Materials science forum
Ser. no.:	631-632

Conference Proceedings

2. Positive chemically amplified resist for ArF excimer laser lithography composed of a novel transparent photoacid generator and an alicyclic terpolymer

K. Nakano ; K. Maeda ; S. Iwasa ; T. Ohfuji ; E. Hasegawa

Pub. info.:	Advances in resist technology and processing XII : 20-22 February 1995, Santa Clara, California. pp.433-444, 1995. Bellingham, WA. Society of Photo-optical Instrumentation Engineers
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	2438

Conference Proceedings

3. Immersion defectivity study with volume production immersion lithography tool

K. Nakano ; H. Kato ; T. Fujiwara ; K. Shiraishi ; Y. Iriuchijima ; S. Owa ; I. Malik ; S. Woodman ; P. Terala ; C. Pelissier ; H. Zhang

Pub. info.:	Optical microlithography XX. 2007. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	6520

Conference Proceedings

4. Immersion defectivity control by optimizing immersion materials and processes

K. Nakano ; H. Kato ; S. Owa

Pub. info.:	Advances in resist materials and processing technology XXIV. 2007. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	6519

Conference Proceedings

5. Current status of water immersion lithography and prospect of higher index method

S. Owa ; K. Nakano ; H. Nagasaka ; H. Kohno ; Y. Ohmura ; M. McCallum

Pub. info.:	EMLC 2007 : 23rd european mask and lithography conference : 22-25 January 2007, Grenoble, France. 2007. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	6533

Conference Proceedings

6. Immersion defectivity study with volume production immersion lithography tool for 45 nm node and below

K. Nakano ; S. Nagaoka ; M. Yoshida ; Y. Iriuchijima ; T. Fujiwara

Pub. info.:	Optical Microlithography XXI. 1 pp.692418-1-692418-11, 2008. Bellingham, Wash.. Society of Photo-optical Instrumentation Engineers
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	6924

Conference Proceedings

7. 193-nm immersion lithography for high volume manufacturing using novel immersion exposure tool and coater/developer system

S. Wakamizu ; H. Kyouda ; K. Nakano ; T. Fujiwara

Pub. info.:	Lithography Asia 2008. 2 pp.714039-1-714039-8, 2008. Bellingham, Wash.. Society of Photo-optical Instrumentation Engineers
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	7140

Conference Proceedings

8. Rb-saturated absorption profile-based enhancement of semiconductor laser frequency stability

K. Nakano ; S. Maehara ; M. Yanagisawa ; Y. Sekiya ; T. Sato ; M. Ohkawa ; T. Maruyama ; S. Kawamura

Pub. info.:	Physics and simulation of optoelectronic devices XV : 22-25 January 2007, San Jose, California, USA. 2007. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	6468

Conference Proceedings

9. Micro and imaging x-ray analysis by using polycapillary x-ray optics

K. Tsuji ; K. Nakano ; M. Yamaguchi ; T. Yonehara

Pub. info.:	Advances in x-ray/EUV optics and components III : 11-13 August 2008, San Diego, California, USA. pp.70770W-1-70770W-8, 2008. Bellingham, Wash.. Society of Photo-optical Instrumentation Engineers
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	7077

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Conference Proceedings

10. Frequency stabilization of a semiconductor laser using both Rb saturated absorption profiles and double optical feedback systems

K. Nakano ; S. Maehara ; M. Yanagisawa ; K. Doi ; T. Sato

Pub. info.:	Advanced materials and devices for sensing and imaging III : 12-14 November 2007, Beijing, China. pp.68290R-1-68290R-11, 2008. Bellingham, Wash.. Society of Photo-optical Instrumentation Engineers
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	6829

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Author: K. Nakano