1.

Conference Proceedings
Conference Proceedings
1. Study of rigorous effects and polarization on phase shifting masks through simulations and in-die phase measurements
K. M. Lee ; M. Tavassoli ; M. Lau ; K. Baik ; B. Lieberman ; S. Perlitz ; U. Buttgereit ; T. Scherubl
Pub. info.: Metrology, inspection, and process control for microlithography XXI.  2007.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6518
2.

Conference Proceedings
Conference Proceedings
2. Novel solution for in-die phase control under scanner equivalent optical settings for 45-nm node and below
S. Perlitz ; U. Buttgereit ; T. Scheruebl ; D. Seidel ; K. M. Lee ; M. Tavassoli
Pub. info.: Photomask and next-generation lithography mask technology XIV.  2007.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6607
3.

Conference Proceedings
Conference Proceedings
3. Scatterometry measurement of nested lines, dual space, and rectangular contact CD on phase-shift masks
K. M. Lee ; S. Yedur ; S. Henrichs ; M. Tavassoli ; K. Baik
Pub. info.: Metrology, inspection, and process control for microlithography XXI.  2007.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6518
4.

Conference Proceedings
Conference Proceedings
4. Laterally resolved off-axis phase measurements on 45-nm node production features using Phame
U. Buttgereit ; S. Perlifz ; D. Seidel ; K. M. Lee ; M. Tavassoli
Pub. info.: Photomask technology 2007.  2  pp.67303E-1-67303E-9,  2007.  Bellingham, Wash..  Society of Photo-optical Instrumentation Engineers
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6730
5.

Conference Proceedings
Conference Proceedings
5. Phase metrology on 45-nm node phase-shift mask structures
K. M. Lee ; M. Tavassoli ; U. Buttgereit ; D. Seidel ; R. Birkner
Pub. info.: Metrology, inspection, and process control for microlithography XXII.  2  pp.69222A-1-69222A-6,  2008.  Bellingham, Wash..  Society of Photo-optical Instrumentation Engineers
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6922