1.

Conference Proceedings
Conference Proceedings
1. Transient Currents Induced in 6H-SiC MOS Capacitors by Oxygen Ion Incidence
N. Iwamoto ; S. Onoda ; T. Ohshima ; K. Kojima ; K. Kawano
Pub. info.: Silicon carbide and related materials 2008 : selected peer reviewed papers from the 7th European Conference on Silicon Carbide and Related Materials, September 7-11 Barcelona, Spain.  pp.517-520,  2009.  Aedermannsdorf, Switzerland.  Trans Tech Publications
Title of ser.: Materials science forum
Ser. no.: 615-617
2.

Conference Proceedings
Conference Proceedings
2. Seed Layer Free Ruthenium Precursor for MOCVD
N. Oshima ; T. Shibutami ; K. Kawano ; S. Yokoyama ; H. Funakubo
Pub. info.: Physicas and technology of high-k gate dielectrics : proceedings of the International Symposium on High Dielectric Constant Materials : Materials Science, Processing, and Reliability, and Manufacturing Issues.  pp.277-286,  2002.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 2002-28
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Conference Proceedings
Conference Proceedings
3. A Novel Iridium Precursor for MOCVD
K. Kawano ; T. Furakawa ; M. Takamori ; K. Tada ; T. Yamakawa ; N. Oshima ; H. Fujisawa ; M. Shimizu
Pub. info.: Physics and technology of high-k gate dielectrics III.  pp.133-138,  2006.  Pennington, N.J..  Electrochemical Society
Title of ser.: ECS transactions
Ser. no.: 1(5)
4.

Conference Proceedings
Conference Proceedings
4. Ruthenium and Ruthenium Oxide Films Deposition by MOCVD Using Ru(DMPD)₂
K. Kawano ; H. Kosuge ; N. Oshima ; H. Funakubo
Pub. info.: Physics and technology of high-k gate dielectrics III.  pp.139-144,  2006.  Pennington, N.J..  Electrochemical Society
Title of ser.: ECS transactions
Ser. no.: 1(5)
5.

Conference Proceedings
Conference Proceedings
5. Lithographic performance of SiNx single-layer halftone mask
K. Kawano ; M. Asano ; S. Tanaka ; T. Iwamatsu ; H. Sato
Pub. info.: Photomask and X-ray mask technology II : 20-21 April 1995, Kawasaki City, Kanagawa, Japan.  pp.348-355,  1995.  Bellingham, WA.  Society of Photo-optical Instrumentation Engineers
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 2512
6.

Conference Proceedings
Conference Proceedings
6. A novel lithography design and verification methodology with patterning failure
S. Miyoshi ; Y. Kobayashi ; S. Tanaka ; K. Kawano ; K. Hashimoto
Pub. info.: Lithography Asia 2008.  1  pp.714011-1-714011-8,  2008.  Bellingham, Wash..  Society of Photo-optical Instrumentation Engineers
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 7140
7.

Conference Proceedings
Conference Proceedings
7. A study of mask specification in spacer patterning technology
H. Mukai ; Y. Kobayashi ; S. Yamaguchi ; K. Kawano ; K. Hashimoto
Pub. info.: Photomask and next-generation lithography mask technology XV.  1  pp.702812-1-702812-8,  2008.  Bellingham, Wash..  Society of Photo-optical Instrumentation Engineers
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 7028
8.

Conference Proceedings
Conference Proceedings
8. Infrared sensor module using uncooled 320 x 240/640 x 480 detector
K. Egashira ; T. Yamamoto ; K. Kawano ; Y. Tanaka ; K. Iida ; T. Fujishima ; T. Kakimoto ; N. Oda
Pub. info.: Infrared technology and applications XXXIII : 9-13 April 2007, Orlando, Florida, USA.  2007.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6542