1.

Conference Proceedings
Conference Proceedings
1. Integration of a new alignment sensor for advanced technology nodes
P. Hinnen ; J. Depre ; S. Tanaka ; S. Lim ; O. Brioso ; M. Shahrjerdy ; K. Ishigo ; T. Kono ; T. Higashiki
Pub. info.: Optical microlithography XX.  2007.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6520
2.

Conference Proceedings
Conference Proceedings
2. Mask image position correction for double patterning lithography
M. Saito ; M. Itoh ; O. Ikenaga ; K. Ishigo
Pub. info.: Photomask and next-generation lithography mask technology XV.  1  pp.70280D-1-70280D-9,  2008.  Bellingham, Wash..  Society of Photo-optical Instrumentation Engineers
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 7028