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11 results

Conference Proceedings

1. Advanced TiN Metal-Gate FinFET Technology

Y. Liu ; E. Sugimata ; T. Matsukawa ; M. Masahara ; K. Endo ; I. Kenichi ; T. Shimizu ; H. Yamauchi ; S. Ouchi ; E. Suzuki

Pub. info.:	Dielectrics for nanosystems II: materials science, processing, reliability, and manufacturing. pp.197-208, 2006. Pennington, N.J.. Electrochemical Society
Title of ser.:	ECS transactions
Ser. no.:	2(1)

Conference Proceedings

2. Magnetic Phase Diagram of the Ferromagnetic Shape Memory Alloys Ni₂MnGa_1-xCu_x

K. Endo ; T. Kanomata ; A. Kimura ; M. Kataoka ; H. Nishihara

Pub. info.:	Advances in magnetic shape memory materials : special topic volume with invited peer reviewed papers only. pp.165-176, 2011. Aedermannsdorf, Switzerland. Trans Tech Publications
Title of ser.:	Materials science forum
Ser. no.:	684

Conference Proceedings

3. Advanced DG-MOSFETs Process Technologies

E. Suzuki ; Y. Liu ; K. Endo ; T. Matsukawa ; M. Masahara

Pub. info.:	ULSI process integration 5. pp.339-348, 2007. Pennington, N.J.. Electrochemical Society
Title of ser.:	ECS transactions
Ser. no.:	11(6)

Conference Proceedings

4. Advanced Metal Gate FinFET CMOS TEchnology

Y. Liu ; T. Matsukawa ; K. Endo ; M. Masahara ; S. Ouchi

Pub. info.:	Dielectrics for nanosystems 3: materials science, processing, reliability, and manufacturing. pp.239-252, 2008. Pennington, N.J.. Electrochemical Society
Title of ser.:	ECS transactions
Ser. no.:	13(2)

Conference Proceedings

5. Experimental Studies on Water Vapor Plasma Oxidation and Thermal Oxidation of 4H-SiC (0001) for Clarification of the Atomic-Scale Flattening Mechanism in Plasma Assisted Polishing

H. Deng ; K. Endo ; K. Yamamura

Pub. info.:	Silicon carbide and related materials 2013 : selected, peer reviewed papers from the 15th International Conference on Silicon Carbide and Related Materials (ICSCRM 2013), September 29 - October 4, 2013, Miyazaki, Japan. pp.587-590, 2014. Aedermannsdorf, Switzerland. Trans Tech Publications
Title of ser.:	Materials science forum
Ser. no.:	778-780

Conference Proceedings

6. High Temperature Reliability of the SiC-MOSFET with Copper Metallization

H. Okabe ; M. Yoshida ; T. Tominaga ; J. Fujita ; K. Endo

Pub. info.:	Silicon carbide and related materials 2013 : selected, peer reviewed papers from the 15th International Conference on Silicon Carbide and Related Materials (ICSCRM 2013), September 29 - October 4, 2013, Miyazaki, Japan. pp.955-958, 2014. Aedermannsdorf, Switzerland. Trans Tech Publications
Title of ser.:	Materials science forum
Ser. no.:	778-780

Conference Proceedings

7. Metalorganic chemical vapor deposition (MOCVD) and atomic force microscopy (AFM) study of high-quality Bi-2223 superconducting thin films

K. Endo

Pub. info.:	Optoelectronic integrated circuit materials, physics, and devices : 6-9 February 1995, San Jose, California. pp.566-574, 1995. Bellingham, WA. Society of Photo-optical Instrumentation Engineers
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	2397

Conference Proceedings

8. Fabrication and Power-Management Demonstration of Four-Terminal FinFETs

K. Endo ; Y. Liu ; M. Masahara ; T. Maisukawa ; S. O'uchi ; E. Suzuki

Pub. info.:	Silicon-on-insulator technology and devices 13. pp.71-82, 2007. Pennington, N.J.. Electrochemical Society
Title of ser.:	ECS transactions
Ser. no.:	6(4)

Conference Proceedings

9. Novel technology of automatic macro inspection for 32-nm node and best focus detection

K. Fukazawa ; K. Endo ; K. Yoshino ; Y. Yamazaki

Pub. info.:	Metrology, inspection, and process control for microlithography XXI. 2007. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	6518

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Conference Proceedings

10. Surface gradient integrated profiler for x-ray and EUV optics: self calibration method of measured position for an off-axis parabolic mirror (f=150mm) measurement

Y. Higashi ; K. Endo ; T. Kume ; K. Enami ; J. Uchikoshi

Pub. info.:	Advances in metrology for x-ray and EUV optics II : 30 August 2007, San Diego, California, USA. pp.67040D-1-67040D-8, 2007. Bellingham, Wash.. Society of Photo-optical Instrumentation Engineers
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	6704

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Author: K. Endo