H. Zang ; W. Loh ; H. Oh ; K. Choi ; H. Nguyen ; P. Lo ; B. Cho
Pub. info.:
Advanced gate stack, source/drain and channel engineering for Si-based CMOS 3 : new materials, processes and equipment. pp.105-112, 2007. Pennington, NJ. Electrochemical Society
H. Oh ; K. Choi ; W. Loh ; T. Htoo ; S. Chua ; B. Cho
Pub. info.:
Advanced gate stack, source/drain and channel engineering for Si-based CMOS 3 : new materials, processes and equipment. pp.95-98, 2007. Pennington, NJ. Electrochemical Society
Advanced gate stack, source/drain and channel engineering for Si-based CMOS 3 : new materials, processes and equipment. pp.41-52, 2007. Pennington, NJ. Electrochemical Society
THERMEC 2016 : selected peer reviewed papers from the 9th International Conference on Processing & Manufacturing of Advanced Materials, May 29 - June 03, 2016, Graz, Austria. pp.339-343, 2017. Aedermannsdorf, Switzerland. Trans Tech Publications
Advanced welding and micro joining/packaging for the 21st century : selected peer reviewed papers from the International Welding/Joining Conference, Korea 2007 (IWJC, Korea 2007), which was held from 10th-12th May 2007 at COEX, Seoul, Korea. pp.637-644, 2008. Aedermannsdorf, Switzerland. Trans Tech Publications