1.

Conference Proceedings
Conference Proceedings
1. Mask characterization for double patterning lithography
K. Bubke ; E. Cotte ; J. H. Peters ; R. de Kruif ; M. Dusa
Pub. info.: Photomask technology 2007.  1  pp.67301H-1-67301H-10,  2007.  Bellingham, Wash..  Society of Photo-optical Instrumentation Engineers
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6730
2.

Conference Proceedings
Conference Proceedings
2. Wafer based mask characterization for double patterning lithography
R. de Kruif ; K. Bubke ; G.-J. Janssen ; E. van der Heijden ; J. Fochler
Pub. info.: EMLC 2008 : 24th European Mask and Lithography Conference : 21-24 January 2008, Dresden, Germany.  pp.679204-1-679204-12,  2008.  Bellingham, Wash..  Society of Photo-optical Instrumentation Engineers
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6792