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Conference Proceedings

1. First microprocessors with immersion lithography

Lee, D.-Y. ; Kim, I.-S. ; Jung, S.-G. ; Jung, M.-H. ; Park, J.-O. ; Oh, S.-H. ; Woo, S.-G. ; Cho, H.-K. ; Moon, J.-T.

Pub. info.:	Optical microlithography XVIII : 1-4 March, 2005, San Jose, California, USA. pp.119-128, 2005. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5754

Conference Proceedings

2. Efffectiveness and confirmation of local area flare measurement method in various pattern layouts

Nam, D. ; Lee, E. ; Jung, S.-G. ; Kang, Y. ; Yeo, G.-S. ; Lee, J.-H. ; Cho, H.-K. ; Han, W.-S. ; Moon, J.-T.

Pub. info.:	Optical Microlithography XV. Part One pp.57-66, 2002. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4691

Conference Proceedings

3. Attainable road to the lower-k1 extension using high-transmittance attenuated phase-shifting mask in the KrF lithography world

Kim, I.-S. ; Jung, S.-G. ; Kim, H.-D. ; Yeo, G.-S. ; Shin, I.-K. ; Lee, J.-H. ; Cho, H.-K. ; Moon, J.-T.

Pub. info.:	Optical Microlithography XV. Part One pp.466-475, 2002. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4691

Conference Proceedings

4. Assessments on process parameters' influences to the proximity correction

Lee, E.-M. ; Lee, S.-W. ; Lee, D.-Y. ; Choi, S.-H. ; Park, J.-O. ; Jung, S.-G. ; Yeo, G.-S. ; Lee, J.-H. ; Cho, H.-K. ; Han, W.-S.

Pub. info.:	Metrology, Inspection, and Process Control for Microlithography XVIII. pp.287-295, 2004. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5375