1.

Conference Proceedings
Conference Proceedings
1. First microprocessors with immersion lithography
Lee, D.-Y. ; Kim, I.-S. ; Jung, S.-G. ; Jung, M.-H. ; Park, J.-O. ; Oh, S.-H. ; Woo, S.-G. ; Cho, H.-K. ; Moon, J.-T.
Pub. info.: Optical microlithography XVIII : 1-4 March, 2005, San Jose, California, USA.  pp.119-128,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5754
2.

Conference Proceedings
Conference Proceedings
2. Analysis of solvent effect to control the BARC coating uniformity
Jung, M.-H. ; Yoon, S. ; Chung, E.-S. ; Yoo, B.-S. ; Ya, J.Y. ; Winning, D. ; Kim, B.D. ; Lee, H. ; Kim, D.Y. ; Kim, Y.H. ; Kim, M. ; Chon, S.-M.
Pub. info.: Advances in Resist Technology and Processing XXI.  pp.703-710,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5376
3.

Conference Proceedings
Conference Proceedings
3. Performance of a SSQ-type ArF bilayer resist in 80-nm node DRAM line and space fabrication
Jung, M.-H. ; Kim, H.-W. ; Hong, J. ; Woo, S.-G. ; Cho, H.-K. ; Han, W.-S.
Pub. info.: Advances in Resist Technology and Processing XXI.  pp.1100-1106,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5376
4.

Conference Proceedings
Conference Proceedings
4. Improvement of pattern collapse in sub-100 nm nodes
Jung, M.-H. ; Lee, S.-H. ; Kim, H.-W. ; Woo, S.-G. ; Cho, H.-K. ; Han, W.-S.
Pub. info.: Advances in Resist Technology and Processing XX.  2  pp.1298-1303,  2003.  Bellingham, CA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5039