1.

Conference Proceedings
Conference Proceedings
1. High-performance 193-nm photoresist materials based on ROMA polymers: sub-90-nm contact hole application with resist reflow
Joo, H.S. ; Seo, D.C. ; Kim, C.M. ; Lim, Y.T. ; Cho, S.D. ; Lee, J.B. ; Song, J.Y. ; Kim, K.M. ; Park, J.H. ; Jung, J.C. ; Shin, K.S. ; Bok, C.K. ; Moon, S.C.
Pub. info.: Advances in Resist Technology and Processing XXI.  pp.126-133,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5376
2.

Conference Proceedings
Conference Proceedings
2. Quencher gradient resist process for low-k process
Jung, J.C. ; Lee, S.K. ; Lee, W.W. ; Bok, C.K. ; Moon, S.C. ; Shin, K.S.
Pub. info.: Advances in Resist Technology and Processing XXI.  pp.63-70,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5376
3.

Conference Proceedings
Conference Proceedings
3. High-etch-rate ArF BARC composed of polyester
Hwang, Y.S. ; Jung, J.C. ; Ban, K.D. ; Park, S. ; Bok, C.K. ; Moon, S.C. ; Shin, K.S.
Pub. info.: Advances in Resist Technology and Processing XXI.  pp.718-723,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5376
4.

Conference Proceedings
Conference Proceedings
4. PEB sensitivity variation of 193-nm resist according to activation energy of protection groups
Oh, S.K. ; Kim, J.Y. ; Lee, J.W. ; Kim, D. ; Kim, J. ; Lee, G. ; Jung, J.C. ; Bok, C.K. ; Shin, K.S.
Pub. info.: Advances in Resist Technology and Processing XXI.  pp.625-632,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5376
5.

Conference Proceedings
Conference Proceedings
5. Investigation of the effect of resist components and process condition on photochemical efficiency of ArF photoresist
Kim, J.-W. ; Son, E.-K. ; Lee, S.-H. ; Kim, D. ; Kim, J. ; Lee, G. ; Jung, J.C. ; Bok, C.K. ; Moon, S.C. ; Shin, K.S.
Pub. info.: Advances in Resist Technology and Processing XXI.  pp.599-607,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5376
6.

Conference Proceedings
Conference Proceedings
6. New approach for pattern collapse problem by increasing contact area at sub-100nm patterning
Lee, S.-K. ; Jung, J.C. ; Lee, M.S. ; Lee, S.K. ; Kim, S.Y. ; Hwang, Y.-S. ; Bok, C.K. ; Moon, S.-C. ; Shin, K.S. ; Kim, S.-J.
Pub. info.: Advances in Resist Technology and Processing XX.  1  pp.166-174,  2003.  Bellingham, CA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5039
7.

Conference Proceedings
Conference Proceedings
7. Ring opened maleic anhydride and norbornene copolymers (ROMA) have a good character in resist flow process for 193-nm resist technology
Joo, H.-S. ; Seo, D.C. ; Kim, C.M. ; Lim, Y.T. ; Cho, S.D. ; Lee, J.B. ; Jeon, H.P. ; Park, J.H. ; Jung, J.C. ; Shin, K.S. ; Bok, C.K. ; Moon, S.-C.
Pub. info.: Advances in Resist Technology and Processing XX.  2  pp.725-732,  2003.  Bellingham, CA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5039