1.

Conference Proceedings
Conference Proceedings
1. Mask CD correction method using dry-etch process [6349-li]
Jung, H. Y. ; Ha, T. J. ; Shin, J. C. ; Jeong, K. C. ; Kim, Y. K. ; Han, O.
Pub. info.: Photomask Technology 2006.  pp.63490B-,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6349
2.

Conference Proceedings
Conference Proceedings
2. Effect of UV/O3 treatment on mask surface to reducing sulfuric residue ions
Lee, D. W. ; Jung, H. Y. ; Kim, M. S. ; Lee, J. S. ; Choi, Y. K. ; Han, O.
Pub. info.: 24th Annual BACUS Symposium on Photomask Technology.  pp.521-528,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5567