1.

Conference Proceedings
Conference Proceedings
1. Structure and property relationships of fractionated novolac resins
Chen,K.-J.R. ; Kwong,R.W. ; Jordhamo,G. ; Allen,R.D. ; Gallagher-Wetmore,P.M.
Pub. info.: Advances in resist technology and processing XIV : 10-12 March 1997, Santa Clara, California.  pp.596-607,  1997.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3049
2.

Conference Proceedings
Conference Proceedings
2. Deep-UV hardening of deep-UV resists
Jordhamo,G. ; Moreau,W.M.
Pub. info.: Advances in resist technology and processing XIII : 11-13 March 1996, San Clara, California.  pp.588-600,  1996.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 2724
3.

Conference Proceedings
Conference Proceedings
3. Dissolution behavior of novolak resins
Chen,R.K.-J. ; Jordhamo,G. ; Moreau,W.M.
Pub. info.: Advances in resist technology and processing XIII : 11-13 March 1996, San Clara, California.  pp.553-562,  1996.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 2724
4.

Conference Proceedings
Conference Proceedings
4. Photoresist ultrafiltration optimization
Jordhamo,G. ; Melville,I. ; Mewherter,A.M.
Pub. info.: Advances in resist technology and processing XV : 23-25 February 1998, Santa Clara, California.  Part 2  pp.1132-1159,  1998.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3333
5.

Conference Proceedings
Conference Proceedings
5. "193-nm single-layer resist materials: total consideration of design, physical properties, and lithographic performances on all major alicyclic platform chemistries"
Kajita,T. ; Nishimura,Y. ; Yamamoto,M. ; Ishii,H. ; Soyano,A. ; Kataoka,A. ; Slezak,M. ; Shimizu,M. ; Varanasi,P.R. ; Jordhamo,G. ; Lawson,M.C. ; Chen,R. ; Brunsvold,W.R. ; Li,W. ; Allen,R.D. ; Ito,H. ; Truong,H.D. ; Wallow,T.I.
Pub. info.: Advances in Resist Technology and Processing XVIII.  4345  pp.712-724,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4345